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Xanofi Demonstrates Their Game Changing Production of Nanofibers

Xanofi, a company specializing in producing custom, low-cost, functional nanofibers for applications announces their upcoming event schedule and demonstrations. The company is currently identifying industry partners that seek nanotechnology solutions for their products.

Posted: Mar 17th, 2011

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Applied Materials Expands the Limits of Darkfield Wafer Inspection with Deep Ultraviolet Laser Technology

Applied Materials, Inc. announced a technology breakthrough for inspecting the challenging interconnect layers in 22nm and below memory and logic chips. The new Applied DFinderTM inspection system is the first darkfield tool to employ deep ultraviolet (DUV) laser technology, providing chip manufacturers with an unprecedented ability to detect exceptionally small particles on patterned wafers in a production environment for higher device yield.

Posted: Mar 17th, 2011

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Serefex Announces Photocatalyst Nanotechnology

Serefex Corporation announced today that it has begun marketing a line of exterior photocatalyst nanotechnology through its master distribution agreement with Rochester Hills, MI based Triton Technology Group.

Posted: Mar 16th, 2011

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MesoCoat Wins $2 Million Ohio Third Frontier Award to Commercialize Advanced Wear and Corrosion Solutions

Abakan Inc. announced today that MesoCoat, Inc., a portfolio company, along with their partner University of Akron (UA) have received a $2 million award from Ohio Third Frontier under the Advanced Energy Program to accelerate the commercial demonstration of CermaClad, a high speed fusion cladding process, and development and qualification of CermaClad nanocomposite ceramic metallic (cermet) materials, along with Ceramers being developed at UA for advanced energy and infrastructure applications.

Posted: Mar 16th, 2011

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Bayer MaterialScience strengthens position in carbon nanotubes

The company concluded a patent license agreement for the use of these materials with U.S. based company Hyperion Catalysis International, Inc. The agreement will help to solidify the leading positions of both companies in research and development as well as production technology for high-quality CNT-based products.

Posted: Mar 16th, 2011

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Asylum Research Introduces Electrochemical Strain Microscopy for Energy Storage Research

Asylum Research, the technology leader in Scanning Probe and Atomic Force Microscopy, has announced the new Electrochemical Strain Microscopy (ESM) imaging technique for its Cypher and MFP-3D AFMs. Developed by Oak Ridge National Laboratory (ORNL) and Asylum Research, ESM is an innovative scanning probe microscopy technique capable of probing electrochemical reactivity and ionic flows in solids on the sub-ten-nanometer level.

Posted: Mar 15th, 2011

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