Piezo Nanopositioning Systems specialist PI (Physik Instrumente) has introduced a new piezo-Z nanopositioning system for imaging and fast focusing applications. It consists of large aperture piezo stage and a digital controller.
Dolomite, a world leader in the design and manufacture of microfluidic products, has launched Telos, an innovative system for high throughput droplet, particle, and flow product generation. It benefits a wide range of applications including: DNA, cell and bead encapsulation and screening, emulsion and foam generation, microparticle and nanoparticle synthesis and micro-reaction engineering.
EDAX, Inc., a leader in X-ray microanalysis and electron diffraction instrumentation, has developed a new advanced imaging tool that allows Scanning Electron Microscopes to obtain crystallographic, compositional and topographical contrast images with unprecedented flexibility in signal collection and processing.
Picosun Oy, the leading Atomic Layer Deposition (ALD) equipment manufacturer, has expanded its selection of high volume manufacturing solutions by launching a patented, fully automatic sample handling system based on industrial robotics.
Asylum Research, an Oxford Instruments company, will host a new webinar on March 20, 'AFM Imaging and Nanomechanics with blueDrive Photothermal Excitation'. blueDrive is a new option available on the Asylum Research Cypher AFM that reinvents tapping mode imaging for remarkably simple, incredibly stable, and strikingly accurate operation.
The Semiconductor Manufacturing Technology business group of ZEISS made significant progress in the development of the actinic aerial image metrology system AIMS EUV. First images of EUV photomasks were taken by the prototype of the system.
Quantum Materials Corporation and Los Alamos National Laboratory's announce Quantum Materials optioning Thick-Shell 'Giant' Quantum Dot patented technology with the potential of 10 to 100-fold improvement in solid-state brightness over conventional nanocrystal quantum dots.
The PVD of nano-columns technology developed by Kyma deposits a high-quality growth initiation layer of aluminum nitride on wafers prior to gallium nitride deposition. GT plans to commercialize a PVD tool that will complement its hydride vapor phase epitaxy system, which is currently in development.