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BioNanomatrix to Introduce nanoAnalyzer 1000 System

BioNanomatrix, Inc., which is developing and commercializing breakthrough single-molecule genomic analysis technology, will introduce next month the nanoAnalyzer 1000 System at the American Society of Human Genetics (ASHG) Annual Meeting from November 2-6, 2010 in Washington, D.C.

Posted: Oct 28th, 2010

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CHiL Semiconductor Picks Silicon Frontline for Nanometer Design Analysis

Silicon Frontline Technology, Inc., the silicon-proven, full-chip, field-solver company, announced today that its R3D for 3D extraction and analysis of large resistive power device designs has been selected by CHiL Semiconductor Corporation, a fabless power management solutions company. R3D reduces CHiL's products' energy consumption.

Posted: Oct 27th, 2010

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Mattson Technology Millios System at Fraunhofer CNT Selected for Development of Advanced Millisecond Anneal Applications

Mattson Technology, Inc., a leading supplier of advanced process equipment used to manufacture semiconductors, today announced that its Millios system, which has been upgraded with the latest temperature measurement and control features at the Fraunhofer Center Nanoelectronic Technologies (CNT), has been selected for joint projects with CNT's leading IC partners for the development of advanced millisecond anneal applications at the 3X nanometer technology nodes and below.

Posted: Oct 27th, 2010

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Atrenta and CEA-Leti Sign a Multi-Year Collaboration Agreement

Atrenta Inc., the leading provider of Early Design Closure solutions to radically improve design efficiency throughout the IC design flow, announced today the signing of a multi-year collaboration agreement with CEA-Leti, the Electronics and Information Technology Laboratory of the French Atomic Energy Commission.

Posted: Oct 27th, 2010

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Picosun's Batch Production ALD System Delivered to Sensonor

Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition systems announced having installed the first of its new series of SUNALE P-300B ALD batch systems at Sensonor's wafer fab in Horten, Norway, where it will be used in the production of microbolometer sensors used for thermal imaging.

Posted: Oct 27th, 2010

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