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ASML Reveals EUV Lithography Roadmap to 11 Nanometers and Beyond

ASML Holding NV (ASML) presents today at the 2008 International Symposium on Extreme Ultraviolet Lithography (EUV) on recent achievements in its EUV lithography program and unveils a production system roadmap that supports cost-effective chip manufacturing to at least 11 nanometers (nm).

Posted: Sep 30th, 2008

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Micronics Receives Two New Patents on Microfluidic Technologies

Micronics, Inc. today announced that it has been issued two patents from the United States Patent and Trademark Office (USPTO) for novel microfluidic devices and methods. These new patents relate to the company?s focus on the development of rapid and easy to use clinical diagnostic products.

Posted: Sep 29th, 2008

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Nano Tensile Testing Of Human Hair

Researchers in India have been investigating the nano tensile properties of human hair using an LFPlus single column materials testing machine and NEXYGENPlus control and analysis software from Lloyd Instruments.

Posted: Sep 29th, 2008

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Chinese and U.S. Cleantech Get-Together

The New England Chinese Information and Networking Association (NECINA) announced its inaugural U.S.-China Clean Technology Exchange Conference, scheduled for Saturday, October 18 in Chelmsford, Mass. Coinciding with the launch of the NECINA CleanTech Forum (NCTF), the conference will feature speakers who are leading some of the most important clean technology initiatives in the U.S. and China.

Posted: Sep 27th, 2008

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