AMD, working together with its research partner, IBM, announced it has produced a working test chip utilizing Extreme Ultra-Violet (EUV) lithography for the critical first layer of metal connections across the entire chip.
NanoImaging Services, Inc., the leading provider of high-resolution, three-dimensional transmission electron microscope imaging services to manufacturers of large molecule biopharmaceuticals, announced today that it has completed a round of financing led by Merck Capital Ventures, LLC. The $1.5 million investment will be used to expand the company’s service laboratory.
Sigma-Aldrich and NeuroSurvival Technologies Ltd. (NST) announced today that they have signed a licensing agreement for a leading marker, developed by NST, for molecular imaging of apoptosis in vitro and in vivo in animals. The marker, developed by NST, will be manufactured and marketed by Sigma-Aldrich under the commercial name Apo-TRACE.
NIL Technology ApS has entered an agreement with Nanolithosolution Inc. to promote and sell Nanolithosolution tools in Europe. In less than 10 minutes, cleanrooms can change a regular UV-aligner into a UV nanoimprint lithography (NIL) tool - enabling NIL using existing equipment.
The Rice Business Plan Competition hosted by the Rice Alliance for Technology and Entrepreneurship and the Jones Graduate School of Management at Rice University will again be the largest and richest, graduate-level competition in the world with more than $600,000 in prizes and 36 teams from around the globe. The 2008 RBPC nearly doubled prize money from last year’s competition prizes of $345,000 and tripled the number of applicants, from 75 to 225, with a large portion coming from international teams.
Arrowhead Publishers and Conferences is proud to announce that it is hosting its 2nd Annual Drug Delivery Summit: New Technologies and Commercialization Trends in San Francisco, California on May 1st and 2nd, 2008.
Yamaha Motor Corporation, USA announced today that its new lightweight, nano-engineered hull and deck material, NanoXcel, has won the JEC Group's 2008 Innovation Award, the world's most prestigious recognition in the composites industry.
NeoPhotonics, a leading supplier of photonic integrated circuit (PIC) based components, modules and subsystems for the telecom and CATV industries, will debut at OFC a new high power tunable laser for DWDM (dense wavelength division multiplexing) networks that has an output power of 40 mW and other features ideal for DQPSK coding and 40 Gbps systems.
Nanophase Technologies, a technology leader in nanomaterials and advanced nanoengineered products, today announced it will participate in a web-based interactive question and answer session offered on the Seeking Alpha website.
OKI Printing Solutions today announced that its revolutionary Epi Film Bonding (EFB) technology has been awarded the most prestigious New Machinery Promotion Award by the Minister of Economy, Trade and Industry (METI) in Japan.
Advanced Diamond Technologies, Inc. (ADT), a leader in developing and applying diamond films for industrial, electronic, and medical applications, launches a revolutionary family of mechanical seals to improve efficiency, save energy, and reduce costs in fluid pumping systems.
Rexahn Pharmaceuticals, Inc., a biopharmaceutical company dedicated to the discovery, development, and commercialization of innovative treatments for cancer, central nervous system disorders, sexual dysfunction and other unmet medical needs, today announced that it has been awarded a grant totaling $217,761 through the Maryland Industrial Partnerships Program (MIPS).
Rohm and Haas Electronic Materials, a leading supplier of advanced lithography materials for the semiconductor industry, has entered into a joint development agreement with IBM to create patterning materials and processes to enable implant at and below the 32 nm node.
Molecular Imprints, Inc. (MII) today introduced the latest addition to its family of imprint lithography tools for semiconductor applications—the Imprio 300. Incorporating improvements in automation, tool throughput and overlay performance, the Imprio 300 represents the industry’s highest resolution and lowest cost-of-ownership (CoO) patterning solution for IC prototyping and process development at the 32nm node and beyond.