Applied Nanotech Holdings, Inc., a global leader in nanotechnology research and development, and Nanofilm, Ltd., a private company with a leading market position for specialty optical coatings, cleaners and nano-composite products, jointly announce they have signed a Letter of Intent to combine through a stock swap transaction.
The new modules integrate NAND chips fabricated with Toshiba's 19nm second generation process technology and are fully compliant with the latest e-MMCTM standard. Designed for application in a wide range of digital consumer products, the new modules are targeted to smartphones, tablet PCs and digital video cameras.
Abaxis, Inc., a medical products company manufacturing point-of-care blood instrumentation and consumables to the medical, research and veterinary markets, and privately-held LamdaGen Corporation, an optical biosensor company, announced today an R+D agreement to integrate LamdaGen's high-sensitivity Plasmonic ELISA technology on the Abaxis Piccolo and VetScan rotors.
Leica Microsystems continues to extend the capabilities of confocal super-resolution with its new STED platform Leica TCS SP8 STED 3X. The first presentation to the public will be at the annual meetings of the Society for Neurology in San Diego, USA, and of the Association for Cell Biology in New Orleans, USA, during November and December 2013 respectively.
Canatu launched its new Generation 5 product family of CNB transparent conductive films for touch sensors, paving the way for high-contrast touch displays and revolutionary printed, flexible, foldable and 3D-shaped touch-enabled electronics products.
The Electronics Group of Henkel has developed a suite of clear conductive inks that provide superior flexibility, printability and conductivity for multiple applications including industrial touch screens, electroluminescent (EL) lighting, solar cell manufacturing and micro-scale LED lighting, among others.
Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optic technology for EUV lithography (EUVL), has unveiled its new line of EUVL solutions to support high volume EUV Lithography in conjunction with successful appearances at the 2013 International Symposium on Extreme Ultraviolet Lithography in Toyama, Japan.
The 10,000 square meter facility will be the company's second fully integrated manufacturing plant, following the first located in Los Angeles, California. The China facility comes at a total investment of $45 million and is expected to be operational by the end of 2014.
Microfluidics specialist Dolomite will be showcasing two groundbreaking devices, Telos and Mitos Dropix, on booth #6 at the 17th International Systems for Chemistry and Life Sciences (MicroTAS) in Freiburg, Germany, from the 27th to the 31st October.