The infection problems increase dramatically worldwide and affects the markets for disinfection products and systems, mainly in food and beverage preservation, pharmaceutical and chemical and water disinfection.
SEMATECH's continuing leadership in developing alternative transistor materials and processes for advanced semiconductors will be further demonstrated here next week at the 2007 IEEE International Electron Devices Meeting.
Dr. Drzaic's presentation, "Is there a Role for Silicon Microelectronics in an Increasingly-flexible World?" will take a broad view of the emergence of flexible electronic devices, and compare the potential of incumbent silicon technologies with emerging microelectronic technologies.
Arrowhead Research Corporation announced today that majority owned subsidiary, Unidym, Inc., has completed a $10.4 million Series C financing. Several financial institutions participated in the round, along with strategic investors Tokyo Electron Ventures and Battelle Memorial Institute. Arrowhead made a $3 million follow on investment.
Applied Materials, Inc. today announced it was named Green Energy Innovator of the Year for its pioneering work on the Applied SunFab Thin Film Line, at a gala presenting the prestigious 9th Annual Platts Global Energy Awards.
Applied Materials, Inc. today unveiled its most advanced defect review SEM, the Applied SEMVision G4, which extends the technology and productivity of Applied’s highly successful SEMVision system to 45 nm and beyond applications.
Veeco Instruments Inc. announced the introduction of its new InSight 3D Automated Atomic Force Microscope Platform, the only metrology system available with the accuracy and precision required for non-destructive, high resolution three-dimensional measurements of critical 45nm and 32nm semiconductor features, with the speed to qualify as a true fab tool.
Xidex Corporation, an Austin-based nanotechnology company, has been awarded a new contract from the Department of Energy for scaleable manufacturing of carbon nanotube based field emission sources for use in scanning electron beam instruments such as scanning electron microscopes and transmission electron microscopes.