Chipworks, the leader in reverse engineering and technical analysis of semiconductors and microelectronic systems announced the arrival, in their labs, of the first production Matsushita UniPhier SoC. Chipworks preliminary analysis confirms that it is manufactured using a 45 nm process technology.
NeoPhotonics today announced the company has been named the second ranked firm in Deloitte's "Technology Fast 50" for Silicon Valley, a ranking of the 50 fastest growing technology, media, telecommunications, and life sciences companies in the region by Deloitte & Touche USA LLP, one of the nation's leading professional services organizations.
Advance Nanotech, Inc. announced today that its Owlstone Nanotech Inc., subsidiary has been awarded an incremental $3.7 million contract by an agency of the U.S. Department of Defense to provide micro-miniature products and related services for detection of chemical warfare agents, toxic industrial chemicals and trace explosive vapors.
HP today announced that Senior Fellow R. Stanley Williams, who initiated and currently leads HP Labs' research in nanotechnology, has received the prestigious Glenn T. Seaborg Medal awarded by the UCLA Department of Chemistry and Biochemistry.
SAFC Hitech, a focus area of SAFC and part of the Sigma-Aldrich Corporation, today announced that it will be participating in a webcast, along with representatives from Aviza Technology and ST Microelectronics, to discuss the subject of Atomic Layer Deposition.
NanoBio Corporation, a biopharmaceutical company focused on developing and commercializing novel products for the prevention and treatment of infectious diseases, today announced the addition of Joyce Sutcliffe, Ph.D., as vice president of research.
IDGLOBAL's latest generation of Nano-Molecular Markers and Track n Trace nanotechnologies can be applied to virtually any product in nano trace amounts, in selected areas and can only be detected by highly sensitive handheld analyzers that are portable and can provide 100% item verification, in the field, in real time in a matter of seconds.
SEMATECH engineers have made significant advances in moving forward the infrastructure that will prepare extreme ultraviolet lithography (EUVL) for cost-effective manufacturing, according to papers being presented at the 2007 International EUVL Symposium.