XEI Scientific Inc. announces the release at Microscopy + Microanalysis meeting in Hartford CT. of the Evactron ES, a new approach to plasma cleaning designed for OEM scanning electron microscope and high vacuum chamber manufacturers.
Silicene Labs, LLC, a pioneer in business-related research on nanomaterials, has created the definitive guide on two-dimensional (2D) materials for business, technology, and investment professionals - the 2D Materials Briefing Book.
The company announced the successful closing of $1.6 million in Series Seed B funding to finance production of cutting edge biological and chemical sensors for the life science, defense, intelligence, and environmental industries.
Oxford Instruments Asylum Research announces the opening of its first Nanotechnology Lab for Atomic Force Microscopy (AFM) in India. The new lab is located at the Oxford Instruments India headquarters in Mumbai and adds to the range of industrial analysis tools available for demonstration.
Haydale, a company focused on enabling technology for the commercialisation of graphene, has announced a non-exclusive agreement with Goodfellow, a leading supplier and marketer of metals and materials for industry and research.
Differently from other mechanical chucks, porous chucks use a pressure differential between the front and back side of the surface in order to hold the substrate: using this technique it is possible to work on extremely thin substrates without any risk of breakage.
A new competition is set to give small and mediums-sized engineering and manufacturing businesses in the nanotechnology field the chance to win up to EUR 2.5m worth of R+D funding to develop innovative new products.
Haydale, the company focused on enabling technology for the commercialisation of graphene and other nano materials, has announced a major consulting agreement with The InVentures Group to accelerate the commercial application of its patent applied for plasma functionalisation technology in graphene, carbon nanotubes and other high performance nanomaterial systems.
Latest technology results from Irresistible Materials have demonstrated a significant jump forwards in achievable resolution via its EUV photoresist. The team have recently demonstrated 13 nm halfpitch resolution patterning, together with promising results at 11 nm halfpitch.