NanoInk announced today the availability of High Density (HD) Tip Arrays for Polymer Pen Lithography (PPL). These high-density elastomeric pen arrays are ideal for high-throughput deposition of ink materials.
NanoSight, leading manufacturers of unique nanoparticle characterization technology, are pleased to announce that the company has been selected to receive the Queen's Award for Enterprise in the category for International Trade 2012.
AZtecTEM packs innovative tools and technologies into a platform specifically designed for the TEM user. It unleashes the potential of the latest generation of large area SDDs, the X-MaxTEM, to enable high quality data acquisition even when counts are low.
NanoH2O's patented thin-film nanocomposite membrane technology can purify water from a broad range of sources, yielding higher productivity, better water quality or reduced energy consumption over traditional membranes.
NeoPhotonics Corporation, a leading designer and manufacturer of photonic integrated circuit, or PIC, based modules and subsystems for bandwidth-intensive, high speed communications networks, today announced that it has received an investment from RUSNANO, a $10 billion sovereign investment corporation located in Moscow, Russia.
A clinical trial has demonstrated that Oncoprex (TUSC2 nanoparticles) can be safely administered in advanced lung cancer patients to halt cancer or shrink primary and metastatic tumors in some patients.
Polytec, a leader in optical measurement technology, and Digital Surf, a leader in surface analysis software, confirmed that Polytec will be launching a new enhanced range of TMS-Report software based upon the latest generation of Digital Surf's industry-standard Mountains Technology.
Digichem, a management innovation enterprise, specializes in exporting chemical ingredients and intermediates for markets that include paint and coatings, adhesives, automotive, electronics, pharmaceutical, printing and packaging and film conversion.
Two out of four members of the SEMATECH EMI Partnership placed orders with Carl Zeiss to purchase an actinic aerial image metrology system AIMS EUV for reviewing defects in advanced masks needed for extreme ultraviolet lithography.
Further patent protection announced for nanofilm electron resistive and emissive coatings deposited by Atomic Layer Deposition that increase lifetime, detector area and gain to levels unattained by conventional methods.