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Picosun is the leading manufacturer of Atomic Layer Deposition (ALD) equipment for micro- and nanotechnology applications. The company has world-wide sales and support organization and distributor partners in ca. 30 countries. Picosun represents continuity to almost four decades of pioneering, exclusive and groundbreaking ALD reactor design and manufacturing. Picosun provides its customers with versatile, reliable and user-friendly ALD process tools, which offer unique scalability from basic research to high volume production with leading process quality and low cost-of-ownership. Picosun’s global headquarters are located in Espoo, Finland, its US headquarters in Detroit, Michigan, and its Asian headquarters in Singapore. Today, PICOSUN™ ALD systems are in daily use in various frontline industries and research organizations across four continents. Dr. Tuomo Suntola, inventor of the ALD technology, is Member of the Board of Directors of Picosun. World’s most experienced ALD reactor designer Sven Lindfors is one of the founders of the company. |
Picosun Showroom |
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| Latest News | |||
| (January 28, 2013) Picosun expands its central role in the field of European semiconductor manufacturing by taking part in a yet new international R&D project, Lab4MEMS. More... | |||
| (December 19, 2012) Picosun launches new Picofloat™ particle coating system More... | |||
| (November 19, 2012) Picosun revolutionizes roll-to-roll ALD technology More... | |||
| (November 5, 2012) Picosun the first Finnish company to join China-Finland Nano Innovation Center in Suzhou More... | |||
| (October 16, 2012) Picosun's co-organizes 2nd China ALD Conference More... | |||
| (August 30, 2012) Picosun's new Picoflow™ diffusion enhancer expands the borders of ALD More... | |||
| (July 30, 2012) Record fiscal year for Picosun More... | |||
| (June 20, 2012) Picosun launches new source system for extremely low vapor pressure and heat sentive ALD precursors More... | |||
| (May 30, 2012) Uppsala University and Picosun strengthen their collaboration on advanced ALD research of emerging electronics More... | |||
| (March 27, 2012) A*STAR Institute of Microelectronics and Picosun announce a joint initiative to develop advanced Atomic Layer Deposition technology for next generation memories and solar cells More... | |||
| (February 16, 2012) PICOSUN™ P-300B ALD batch reactor achieves record particle levels and uniformities at Fraunhofer IPMS More... | |||
| (December 31, 2011) ALD to enable novel, high efficiency silicon nanorod solar cells More... | |||
| (November 30, 2011) Picosun introduces several industrially scalable ALD processes More... | |||
| (October 25, 2011) Picosun introduces next generation of PICOPLATFORM™ ALD cluster tool More... | |||
| (September 27, 2011) Picosun reports breakthrough in ALD technology for advanced corrosion protection More... | |||
| Articles | Downloads | ||
| • | PICOSUN™ R-series ALD process tools publications |  |
Picosun General Brochure (950 KB) |
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Newsletter December 2012 (1.3 MB) | ||
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Newsletter May 2012 (713 KB) | ||
