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Lithography Defectivity Metrology Engineer
Employer: imec
Location: Leuven, Belgium
Employment Start Date: As soon as possible

Organization Description:

Imec performs world-leading research in nano-electronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven (Belgium) and has offices in the Netherlands, US, Taiwan, China, India and Japan. Its staff of more than 2,080 people includes over 550 industrial residents and guest researchers.

The Advanced Patterning Center (APC) is a joint initiative launched by imec and ASML to address the upcoming scaling challenges associated with the chip industry’s move towards single digit nanometer dimensions. The center is located at the imec campus in Leuven (near Brussels) and is expected to grow continuously over the next couple of years. The APC is associated with the imec Supplier Hub, an initiative involving many leading edge semiconductor equipment suppliers, aimed at creating a collaborative environment to investigate the practical interactions between all the different steps in the chip patterning process. The APC and Supplier Hub will use actual devices to analyze and optimize process steps as well as materials and device architecture choices, while applying integrated metrology. For the APC we are looking for a Lithography Defectivity Metrology Engineer (m/f).



Job Description:

Job Description

The primary responsibility of this position is to develop effective inspection strategy 193i immersion and EUV lithography, which also includes performing accurate analysis of any defect types with respect to implementation of advanced technology processes.  Specific responsibilities will include:

  • Acquire thorough knowledge of defect inspection and review tool set and inspection techniques.
  • Acquire comprehensive knowledge of defect types and classification for 193i immersion defectivity.
  • Develop defect characterization techniques and defect inspection recipes to meet defect capturing rate requirements for technology nodes N10 and beyond.
  • Define and execute experiments, analyze experimental results to partition process tool or process related defectivity with respect to advanced processes.
  • Drive equipment suppliers to improve inspection and review techniques as well as capabilities.
  • Drive defect JDPs with one main customer.




  • You have a PhD or equivalent industrial experience in applied science, preferably in Materials Science or Chemical Engineering.
  • Strong background in basic sciences and strong analytical skills.
  • You have hands-on cleanroom (process and equipment) experience.
  • Experience in semiconductor processing, in particular lithography and/or defect inspection metrology is preferred.
  • Ability to work independently with minimum supervision.
  • You have excellent English communication skills both written and oral.

We Offer

We offer you a challenging position in a dynamic and explorative environment, in an international team. This is your opportunity to contribute to technologies that will have an impact on tomorrow’s society.
We offer you an attractive salary added with competitive extra-legal benefits such as an interesting life insurance, hospitalization insurance and long-term disability insurance. Imec takes on the full cost of these insurances.

On top of that you receive meal vouchers for each working day. Furthermore, imec offers various training possibilities and social services, such as a company restaurant, ironing service, the possibility of day care nearby, holiday daycare and discounts in different sport clubs and shops.  To decrease our ecological footprint 100% of the transport by train is reimbursed by imec.

Job Application:

Apply online at 

For more information of the APC launch kindly refer to    

Date Posted: August 1, 2014