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Posted: Oct 16, 2014

63 Picometer Atomic Resolution TEM from JEOL

(Nanowerk News) Just introduced in the USA at M&M 2014 (Hartford, CT), the new JEOL JEM-ARM300F Transmission Electron Microscope exceeds atomic resolution boundaries for any commercially-available TEM today. The 300kV microscope, nicknamed the "Grand ARM", increases STEM resolution to 63 picometers.
Designed to meet the most advanced materials development requirements for atom-by-atom characterization and chemical mapping, the Grand ARM offers the highest level of performance in the JEOL line of atomic resolution microscopes. The JEOL atomic resolution TEM features unprecedented stability and aberration correction. The 200kV system, the JEM-ARM200F, has already gained worldwide use with over 125 units installed at some of the most advanced research facilities.
Transmission Electron Microscope
Features of the New GRAND ARM
  • Extreme resolution of 63pm is achieved in STEM mode at an accelerating voltage of 300kV. The GRAND ARM supports accelerating voltage levels of 300kV and 80kV as standard.
  • JEOL-proprietary spherical aberration correctors are integrated in the image-forming system and illumination system, and automatically controlled using the JEOL COSMO corrector system module.
  • An ultra-stable cold-cathode field emission electron gun features a high brightness beam with minimum chromatic aberration.
  • A complete line of signal detectors are available, including EDS up to 100mm2 and EELS, backscattered electron detectors, and up to 4 STEM detectors. The TEM also supports simultaneous observation of high angle annular dark field image, low angle annular dark field image, annular bright field image, and bright field image.
  • The vacuum system is specially designed for pre-evacuation and enhanced column evacuation, achieving higher vacuum while minimizing contamination.
  • Extreme stability is the hallmark of the JEOL atomic resolution microscopes, with high mechanical rigidity in the column and base unit, and enhance mechanical/electrical stability and resistance to environment.
  • The Grand ARM can be configured for ultrahigh resolution imaging or analytical applications for high sensitivity and in situ analysis according to the user's needs. For more information, visit
    Source: JEOL (press release)
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