(Nanowerk News) Picosun Oy, the leading provider of high quality Atomic Layer Deposition (ALD) equipment and solutions for global industries, launches production scale roll-to-roll ALD system which is especially suitable for printed electronics applications.
Picosun’s patented roll-to-roll ALD technology allows continuous ALD processing on flexible substrates up to 300 mm of width. The configuration follows the success of Picosun’s research scale R-200R ALD system which has already proven its efficiency and cutting-edge design in moisture and gas diffusion barrier applications. The same, leading quality ALD encapsulant films can now be manufactured on large scale, utilizing the industry-standard P-300 reactor frame.
“Quick, predictive reacting to industrial manufacturing trends is a part of Picosun’s continuous success. Our leading experience in ALD system design now allows us to offer first class roll-to-roll ALD solutions to our customers. Our patented continuous pulsing ALD method is an ideal way to protect printed electronics and flexible OLEDs, both of which have forecasted markets worth of billions of dollars,” states Juhana Kostamo, Managing Director of Picosun.
Picosun provides the most advanced ALD thin film technology and enables the industrial leap into the future by novel, cutting-edge coating solutions, with four decades of continuous expertise in the field. Today, PICOSUN™ ALD systems are in daily production use in numerous major industries around the world. Picosun is based in Finland, with subsidiaries in USA, China, and Singapore, and a world-wide sales and support network.