(Nanowerk News) Picosun Oy, a leading provider of high quality Atomic Layer Deposition (ALD) equipment and solutions for global industries, now offers ALD systems for production-scale coating of powders.
Picosun's large scale POCA™ 300 powder cartridge is designed to fit the industry-standard PICOSUN™ P-300 reactor frame. Its patented construction is based on Picosun's successful R&D scale POCA™ 200 powder coating system with which top quality ALD coatings have been manufactured on several types of powderous carriers. These coatings enable applications such as functionalization of catalysts, solid state batteries, and light-emitting phosphors. The POCA™ 300 system is equipped with Picosun's innovative Picovibe™ feature, ensuring highly uniform and conformal ALD film formation around every single particle in the batch.
"ALD opens up new possibilities for next generation material manufacturing in e.g. energy storage, catalyst, pharmacological, and lighting industries. Our POCA™ 300 large scale powder coating system with the Picovibe™ feature meets the ever-increasing demand for efficient particle ALD processing from several of our production customers in various fields of industry," states Juhana Kostamo, Managing Director of Picosun.
Picosun provides the most advanced ALD thin film technology and enables the industrial leap into the future by novel, cutting-edge coating solutions, with four decades of continuous expertise in the field.
Today, PICOSUN™ ALD systems are in daily production use in numerous major industries around the world. Picosun is based in Finland, with subsidiaries in USA, China, and Singapore, and a world-wide sales and support network.