Park Systems Introduces Park NX-Hivac, a High Vacuum SSRM AFM System for Optimal Results in Semiconductor Manufacturing Failure Analysis
(Nanowerk News) Park Systems, world-leader in atomic force microscopy (AFM) today announced NX-Hivac, the only high vacuum AFM system in the market that meets the current and future needs for failure analysis semiconductor manufacturing. Park NX-Hivac is ideal for academic and industrial customers who are interested in failure analysis solutions in highly doped semiconductor processing where more highly sophisticated failure analysis tools are now required.
Park Systems NX-Hivac High Vacuum SSRM AFM System.
The high vacuum scanning spreading resistance microscopy (SSRM) of Park NX-Hivac enables 2D carrier profiling of next generation devices and measures the high resolution SSRM image under high vacuum conditions to minimize sample-tip damage and improve production yield. Park NX-Hivac is very sensitive and responsive to the current signal for its accurate measurement and repeatability.
"The ever shrinking nanoscale geometries of semiconductor devices require sophisticated failure analysis tools which are the trademark of Park Systems AFM," commented Keibock Lee, Park Systems President. "Our customer-centric engineering and product development team is focused on failure analysis solutions for the manufacturing environment that ultimately facilitates the advancement of nanoscale production. Our commitment to superior products that enhance the customer's performance led to the development of NX-Hivac, which was designed in collaboration with a major semiconductor IC producer."
Designed with the capability for multiple sample loading (up to 5), Park NX-Hivac is also able to measure a wide dynamic range of dopant concentration (7 decades). Other features include a fast signal response even at the range of insulator – metal where the conductance is being changed dramatically. A significant advantage of NX-Hivac is that the high vacuum SSRM measurement shows much higher sensitivity and resolution than ambient condition. This is due to the applied force between the tip and sample under ambient or dry nitrogen condition which is 4 times higher than in a vacuum. The low force required reduces the strain of thin films of target samples, giving a higher spatial resolution, resulting in longer tip life and increased productivity.
Park NX-Hivac complete system includes Park's unique design features such as closed-loop XY Scanner for accurate zoom-in imaging, low noise ratio (0.30 Å even when vacuum pump is ON), increased tip lifetime and the reliability of guaranteed repeatability. Special features such as software control for automatic pumping and venting, motorized laser alignment and high resolution axis-optics enhance the ease of use for operator.
About Park Systems
Park Systems is a world-leading manufacturer of atomic force microscopy (AFM) systems. Park USA is in Santa Clara, California with global manufacturing and R&D in Korea. Park's products are sold and supported worldwide with regional headquarters in the US, Korea, Japan, and Singapore, and distribution partners throughout Europe, Asia, and America. Please visit http://www.parkafm.com or call 408-986-1110 for more information.