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Posted: April 16, 2009

ASML Terminates Micronic Licences for Optical Maskless Lithography

(Nanowerk News) Micronic Laser Systems AB and ASML Netherlands B.V. signed in December 2004 a license agreement giving ASML the right to market optical maskless lithography for semiconductor applications based on Micronic's patent portfolio in the SLM (Spatial Light Modulator) and data path technology.
ASML has terminated its licenses.
This means that Micronic regains the right to fully use the above mentioned patents at its own discretion. Micronic's right to use ASML's development of the SLM technology for photomask applications continues. Micronic shall repay an advance payment of royalties amounting to 13 MEUR. The advance payment is interest-bearing and the repayment does not affect Micronic's net cash and will have no impact on Micronic's result.
About Micronic Laser Systems AB
Micronic Laser Systems is a Swedish high-tech company engaged in the development, manufacture and marketing of a series of extremely accurate laser pattern generators for the production of photomasks. The technology involved is known as microlithography. Micronic´s product offering also includes metrology systems for display photomasks. Micronic´s systems are used by the world´s leading electronics companies in the manufacture of television and computer displays, semiconductor circuits and semiconductor packaging components. Micronic is located in Taby, north of Stockholm and at present has subsidiaries in the United States, Japan, South Korea and in Taiwan.
Source: Micronic Laser Systems (press release)
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