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Posted: May 10, 2009
New Spectroscopic Ellipsometer for Thin Film Applications in the Near Infra Red
(Nanowerk News) The new MM-16 NIR spectroscopic ellipsometer from Horiba is dedicated to thin film characterization, determining thicknesses, optical constants (n,k) and the optical bandgap of materials in the wavelength range 515-1000 nm.
The MM-16 NIR features a CCD detection system for rapid and accurate measurement down to 1s / determination, and a 200Ám microspot allows characterisation of patterned samples. When fully automated the system provides fast uniformity mapping of film thickness and optical constants.
Figure 1: MM-16 NIR, spectroscopic ellipsometer with 300 mm mapping stage - Figure 2: MM-16 NIR, spectroscopic ellipsometer with compact integrated goniometer.
The design of the MM-16 NIR is such that it may be configured in several ways:
Configured with a 200mm x 200mm mapping stage (300mm x 300mm as option) for benchtop thin film characterization. With analysis times of 1s / determination a wafer or panel can be characterised with high resolution very quickly.
Configured with a compact, integrated goniometer to provide a very cost-effective benchtop metrology tool.
Integrated in production lines for in-line quality control of production processes. Standard software provides the user with the ability to perform a fully automatic thin film analysis with in-built reporting, and communication of results to host computers via TCP/IP and RS232 protocols.
Mounted in-situ on process chambers for thin film thickness control of deposited or etched layers.
An optional Spectroscopic Reflectometer may be incorporated into the design for added capability.
The MM-16 NIR is controlled by the DeltaPsi2 software platform that is common to all HORIBA Jobin Yvon thin film metrology tools. DeltaPsi2 software provides display of mapping results on semiconductor wafer and glass panels, statistical analysis of data, import/export package function, and data reprocessing capabilities.
The MM-16 NIR is an easy-to-use, rapid and versatile ellipsometer for demanding research, process development and industrial applications in the photovoltaic, optoelectronic and telecommunication area.