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Posted: May 18, 2009
Veeco's New NEXUS CVD System Enables Thin Film Magnetic Head Areal Densities Greater Than 400Gb/in2
(Nanowerk News) Veeco Instruments Inc. announced today that it has introduced the NEXUS® CVD System, the industry’s first production-proven chemical vapor deposition (CVD) system for demanding conformal seed layer applications. The NEXUS CVD system enables the manufacture of next generation perpendicular magnetic recording (PMR) thin film magnetic heads (TFMH) with areal densities greater than 400 Gb/in2.
Robert P. Oates, Executive Vice President, commented, “In response to the market’s need for a conformal metal deposition process to enable a new generation of PMR heads, Veeco collaborated with a leading thin film head manufacturer to develop the NEXUS CVD system. As a result of this successful collaboration, multiple Veeco NEXUS CVD systems are currently being used in TFMH production at a leading hard disk drive manufacturer, and we are now officially launching it to the broader marketplace. In addition, Veeco is pleased to announce that a second hard drive manufacturer has placed an order for a NEXUS CVD system.”
James T. Jenson, Vice President of Marketing, added, “The NEXUS CVD tool is a great example of Veeco’s alignment with our data storage customers’ technology roadmaps as they invest in increased areal density and lower cost of ownership solutions.” As part of Veeco's NEXUS family, the NEXUS CVD System can be integrated on a common hardware and software platform with complementary Veeco technologies, such as ion beam etch, ion beam deposition and physical vapor deposition.