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Posted: July 1, 2009
Leading Nanotechnology Company Ships its EBPG Electron Beam Lithography System to the Army Research Laboratory
(Nanowerk News) Vistec Lithography announced it will be shipping a new electron beam lithography system to the United States Army for advanced research and development. Representatives from Vistec Lithography Inc. were joined by U.S. Rep. Paul Tonko, representatives from the Watervliet Arsenal and the Arsenal Business & Technology Partnership (Partnership), and the College of Nanoscale Science and Engineering (CNSE) of the University at Albany in making the announcement. This advanced EBPG electron beam lithography system was fully constructed at Vistec's facility at the Watervliet Arsenal, the first system fully built at the new state-of-the-art high tech manufacturing facility, where they moved last November.
In November 2008, New York State Assembly Majority Leader Ron Canestrari, United States Senator Charles E. Schumer, and then-Congressman Mike McNulty along with officials from Vistec, the Partnership, CNSE, and the Watervliet Arsenal officially announced the grand opening of Vistec's new global headquarters and state-of-the-art manufacturing facility in Watervliet. Since then Vistec has continued development and manufacturing of its electron beam lithography systems that are paramount for nanotechnology patterning. The shipment of Vistec's Lithography system to the Army Research Laboratory in Adelphi, MD represents another milestone for the Watervliet nanotechnology lithography company.
Vistec is one of the leading manufacturers of electron beam lithography systems in the world. Vistec's systems use electrons to write patterns that permit the formation of nanotechnology structures which have dimensions of a few nanometers, with a nanometer being a billionth of a meter (A nanometer is approximately 1/100,000 of the thickness of a sheet of paper). These electron beam lithography systems are used across the world for advanced nanotechnology research, development and manufacturing.
The Army Research Laboratory (ARL) is the US Army's corporate basic and applied research laboratory. ARL has been a user of electron beam lithography and Vistec's systems for advanced military devices and applications. The selection of Vistec for ARL's next generation electron beam system will provide ARL with a state-of-the-art high performance, high throughput patterning capability to sub-10 nanometers for today's and tomorrow's research challenges and prototyping. ARL will utilize the Vistec system in its mission to further scientific discoveries, technology advances and analyses for defense applications.
United States Congressman Paul Tonko said, "This collaboration between Vistec and the Army Research Laboratory is important because it provides the Army with the tools to conduct cutting edge research that will help enhance our national security. But this shipment is also significant because it represents the continuing growth of the nanotechnology sector in our region. Vistec is here because of the groundwork that has been laid thanks to the bold vision and hard work of many local leaders across all levels of government, academia and private enterprise. This is a partnership that has brought jobs to our region, enhanced the diversity of our economic makeup, and helps keep the Watervliet Arsenal thriving as the nation's cannon maker and as home to a vibrant technology park."
Papken DerTorrossian, CEO of Vistec Lithography Inc., and Rainer Schmid, General Manager of the Vistec Watervliet facility, congratulated ARL on the system shipment stating, "Vistec has been one of the leading suppliers of electron beam lithography systems to US military defense contractors and laboratories. Vistec and its employees are very proud to have been selected by ARL for its next generation electron beam lithography system, and to have the opportunity to support the Department of Defense and the United States Government's research activities."
Tony Gaetano, President of the Arsenal Business and Technology Partnership, said, "Vistec's success at the Arsenal is just a glimpse of what the future holds for our entire region with the vigorous growth of the semiconductor industry. In addition to its commercial clients, Vistec is now equipping the United States Army and other defense contractors with state-of-the-art R&D tools from the new Arsenal campus. If Vistec were not here, the Army Research Labs would have had to buy it in Asia."
Dr. Alain E. Kaloyeros, Senior Vice President and Chief Executive Officer of CNSE, said, "I congratulate Vistec Lithography on the shipment of its cutting-edge electron beam lithography system to the U.S. Army Research Laboratory, where it will play a pivotal role in accelerating critical high-tech applications in support of the U.S. Army's transition into a 21st century objective military force. This milestone further underscores the successful vision and strategy of Speaker Silver, Majority Leader Canestrari and the New York State Assembly in supporting the State's expanding nanotechnology industry, and demonstrates New York's growing impact in advancing nanoscale technologies that are vital to U.S competitiveness in the global economy."
Watervliet Arsenal Commander, U.S. Army Col. Scott N. Fletcher said, "The Arsenal is committed to working with Vistec Lithography and with our other 30 military and civilian tenant organizations that define today's Arsenal. For nearly 200 years, the Arsenal has been an economic force within the community and we are delighted when one of our business partners achieves success. We all share in that success and therefore, we are very pleased with the Vistec announcement today."
Vistec, in conjunction with New York State officials and CNSE, relocated its facilities from Cambridge, England, to Albany and Watervliet, NY, in 2008 based on growth of New York's nanotechnology industry and academic and research expertise at the UAlbany NanoCollege. Vistec is leasing approximately 30,000 square feet of space in the Watervliet Arsenal, where it has transformed a former Arsenal machine shop into a leading-edge high-tech facility with cleanrooms, production space, and modern offices. Vistec, the Partnership and CNSE worked jointly with M+W Zander, a renowned global architecture, engineering and construction management firm with offices also at the Arsenal, to renovate the space into cutting-edge facilities in support of Vistec's next-generation electron-beam lithography technology. Vistec's world-class research and development center is located at CNSE's Albany NanoTech Complex, the most advanced research enterprise of its kind in the world.
The Vistec Electron Beam Lithography Group combines Vistec Lithography, Inc. (USA) and Vistec Electron Beam GmbH (Germany). Vistec Lithography, Inc. develops, manufactures and sells electron beam lithography equipment based on Gaussian beam technology. Their electron beam systems are employed world-wide in advanced research laboratories, universities and industries encompassing academic, commercial and defense applications. Vistec Electron Beam GmbH is providing electron-beam lithography equipment based on shaped beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron beam systems are used for microchip production and integrated optics as well as for scientific and commercial research.