ASM Sells ALD System to Japan for Insertion in the 32/28nm Technology Node
(Nanowerk News) ASM International N.V. today
announced that it has sold its Pulsar Atomic Layer Deposition (ALD)
system for high-k gates to two top Japanese logic device
manufacturers for insertion in the 32/28nm technology node. The tools
will be used for hafnium-based high-k gate dielectrics, as well as
for the dielectric capping layers used to tune work function of the
gate stack. One customer also ordered ASM's EmerALD process module
for metal gates.
"These orders further extend our leadership position in delivering
manufacturing solutions for high-k gates, having now shipped well
over 100 Pulsar ALD tools," said Bob Hollands, Director of Marketing
for Transistor Products at ASM. "The performance benefits of high-k
films deposited in the Pulsar, and our customer-focused approach that
enables process integration solutions, were key factors in gaining
these new customers. With process integration knowledge for high-k
gates growing, we are seeing the adoption of high-k metal gates now
accelerate rapidly. The combination of Pulsar and EmerALD
demonstrates the benefit of ASM's capability to deposit in a
clustered system the high-k film, the dielectric capping layer and
the metal electrode."
About ASM International
ASM International N.V., headquartered in Almere, the Netherlands, and
its subsidiaries design and manufacture equipment and materials used
to produce semiconductor devices. ASM International and its
subsidiaries provide production solutions for wafer processing
(Front-end segment) as well as assembly and packaging (Back-end
segment) through facilities in the United States, Europe, Japan and
Asia.
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