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Posted: September 2, 2009

FEI Introduces New Solution for Gunshot Residue Analysis in Forensics

(Nanowerk News) FEI Company, a leading provider of high-resolution imaging and analysis systems, today announced the release of two dedicated scanning electron microscopes (SEMs) and a new software package for automated analysis of gunshot residues (GSR). Forensic scientists use GSR analysis to match residues from victims and suspects. The new GSR S50 and GSR F50 SEMs include the newly-released Magnum™ GSR software and specially-modified hardware to provide fully-automated analysis with dramatic improvements in speed, accuracy and affordability.
"These new systems are specifically designed to address the needs of forensic laboratories for fast, reliable analysis," said Paul Scagnetti, vice president and general manager of FEI's Industry Division. "GSR analysis can be a long and tedious process, yet the results are often used to make life and death decisions. The S50 and F50 completely automate the analysis procedure reducing opportunity for operator error. The systems include dedicated validation routines for accurate results. In addition, optimal use of the SEM's imaging capabilities and features, such as the beam current booster, give faster, more repeatable results."
GSR analysis uses high-resolution SEM imaging to locate residue particles, and X-ray spectrometry to determine their elemental composition. The GSR S50's ability to image uncoated samples in low vacuum mode helps preserve sample integrity. The GSR F50's field emission source delivers higher spatial resolution and puts more beam current into a smaller spot for faster, more precise X-ray analysis.
The new Magnum GSR software, included in both systems, uses the SEM's native imaging capabilities to locate particles, which is a much faster method than the conventional approach that uses the X-ray system to control the particle imaging and detection process. A specially-designed beam current booster (BCB) increases beam current during X-ray data acquisition to improve the speed and precision of the analysis. To help optimize price/performance, both systems are fully compatible with the latest high count rate silicon drift X-ray detectors from Bruker Corporation and EDAX. They also include built-in validation procedures that use the latest standard layouts of the ENFSI proficiency tests.
About FEI
FEI is a leading diversified scientific instruments company. It is a premier provider of electron and ion-beam microscopes and tools for nanoscale applications across many industries: industrial and academic materials research, life sciences, semiconductors, data storage, natural resources and more. With a 60-year history of technological innovation and leadership, FEI has set the performance standard in transmission electron microscopes (TEM), scanning electron microscopes (SEM) and DualBeams™, which combine a SEM with a focused ion beam (FIB). FEI's imaging systems provide 3D characterization, analysis and modification/prototyping with resolutions down to the sub-Angstrom (one-tenth of a nanometer) level. FEI's NanoPorts in North America, Europe and Asia provide centers of technical excellence where its world-class community of customers and specialists collaborate. FEI has approximately 1800 employees and sales and service operations in more than 50 countries around the world.
Source: FEI (press release)
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