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Posted: September 2, 2009
Beneq Strengthens its Position in the Plasma Enhanced ALD Equipment Market
(Nanowerk News) Beneq, a company providing industrial and R&D equipment and technology for functional coatings, has further strengthened its position in the plasma enhanced Atomic Layer Deposition (PEALD) equipment market, by establishing a collaboration agreement with Dr. Arthur Sherman, the pioneer and key inventor of PEALD technology.
Dr. Sherman noted that “PEALD technology provides important additional capabilities in expanding ALD process and chemistry options, e.g. for lower process temperatures and for new coating materials, not currently available using traditional thermal ALD.”
Dr. Tommi Vainio, CTO of Beneq, added that “This collaboration agreement with Dr. Sherman further accelerates Beneq´s expansion in the PEALD applications, including not only our current popular R&D ALD systems, TFS 200 and TFS 500, but also future industrial production ALD systems utilizing PEALD capabilities. Beneq´s customers have now access to strong PEALD process support, in addition to the advanced and proven ALD systems from Beneq.”
Related to this collaboration, Dr. Sherman provided the keynote presentation during Beneq´s ALD customer meeting on September 2, 2009.
Beneq Oy, Vantaa, Finland, is a supplier of industrial equipment and technology for global markets. Beneq is turning innovations into success by providing nanotechnology enabled functional coating applications for cleantech and renewable energy areas especially in glass, photovoltaics and emerging thin films markets. Beneq solutions are based on Atomic Layer Deposition (ALD) and proprietary atmospheric nHALO® & nAERO™ aerosol coating technologies.