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Posted: October 27, 2009

Brookhaven National Laboratory Chooses CVD Equipment Corporation for a High Precision In-Vacuum Motion System

(Nanowerk News) CVD Equipment Corporation announced today that Brookhaven National Laboratory has contracted with the Company to design and build a custom Magnetron Sputtering System that will support the new National Synchrotron Light Source II (NSLS-II) project being built at Brookhaven Lab in Upton, Long Island, New York.
The system will deposit critical layers to produce the multilayer lens needed for x-ray focusing at NSLS-II. The system comprises a twenty-three foot long, Ultra High Vacuum (UHV) chamber that contains nine Magnetron Sputtering Guns and a high precision linear motion control mechanism to enable the deposition of a multi film layer stack up to 100µm thick. The automated system features enable the lab to achieve the two-week long coating process (tens of thousands of sputtered layers) with the required precision, constant velocity and repeatable results.
Michael J. Gray, Vice President of Sales and Marketing for CVD Equipment Corporation : , believes that it was CVD’s broad-based competencies which lead to this award. “It was clear that Brookhaven Lab was looking for a platform that will push the envelope of accuracy and precision for in-vacuum motion : ,” said Mr. Gray. “CVD’s unique multi-disciplinary design capabilities and vertical manufacturing integration gave NSLS-II researchers the confidence that we can get the job done. We truly believe there is no other company which could handle such a complex in vacuum motion project.”
“This project allows us to showcase a further range in our core competencies,” said Leonard Rosenbaum, CVD’s Chairman and CEO. “This range of capability is needed by the growing number of researchers who are pushing the limits of nano-material fabrication and related scale up system solutions.”
Ray Conley, Lead Researcher of Optics at NSLS-II, said “work is steadily progressing to push the limit for x-ray focusing to smaller length scales. We felt that CVD’s long history of designing and building state-of-the-art systems, particularly systems that combine vacuum, motion, thin-film deposition and advanced process control solutions, was the right foundation. Once they understood our special needs, CVD engineers presented us with a custom system design. We expect that with CVD’s help we will be able to build custom focusing multilayer diffractive x-ray lenses that focus x-rays down to nanometer-scale spot sizes.”
About CVD Equipment Corporation
CVD Equipment Corporation is a designer and manufacturer of standard and custom state-of-the-art equipment used in the development, design and manufacture of advanced electronic components, materials and coatings for research and industrial applications. CVD offers a broad range of chemical vapor deposition, gas control, and other equipment that is used by customers to research, design and manufacture semiconductors, solar cells, carbon nanotubes, nanowires, LEDs, MEMS, industrial coatings and equipment for surface mounting of components onto printed circuit boards.
Source: CVD Equipment Corporation (press release)
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