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Posted: November 30, 2009

Picosun Launches 200 mm Batch Production ALD System

(Nanowerk News) Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems launched today a 200 mm batch production version of its highly praised design of SUNALE™ ALD process tools. The new SUNALE™ P200B system comes with a large variety of configurations and is able to process up to hundreds of silicon wafers per day. P200B can also process 3D objects with stunning accuracy.
“The SUNALE™ family of ALD reactors has been extremely successful in advanced scientific research and R&D,” says Juhana Kostamo, Managing Director of Picosun.”Our production customers have thus far registered excellent results with Picosun’s P100B production reactor system, but the introduction of the P200B will revolutionize the capabilities we can offer to industries” he says.
200mm wafer batch results
“During the 30+ years of ALD history, people working today for Picosun have designed and produced 15 generations of ALD systems. Picosun’s ancestry in ALD is completely beyond comparison, and it shows in the superior usability and reliability of our products and the terrific quality of results obtained using them”, Kostamo says.
The man who invented and patented the method of ALD in 1975, Dr. Tuomo Suntola, continues to serve as a member of the board of directors of Picosun. Globally by far the most experienced designer of ALD reactors, Mr Sven Lindfors, is CTO of Picosun. Combined, Picosun people possess well over 200 years of first-hand ALD experience and have been instrumental in producing over 100 patents on the science and technique of ALD.
“Despite launching the new P200B only today, we already have several customers evaluating it for their advanced ALD production purposes”, Juhana Kostamo says.
SUNALE™ ALD process tools are well known for the fact that their genial generic design allows results of research to be turned into production use. Usually, when promising laboratory results are being transformed to meet production requirements, the all too common technology gap between the two layers of practise delay or even prevent success in transferring singular success into HVM production. The P200B is yet another demonstration of Picosun’s ability to convincingly bypass these perils.
Picosun develops and manufactures Atomic Layer Deposition ( ALD) reactors for micro- and nanotechnology applications. Picosun represents continuity to over three decades of ALD reactor manufacturing in Finland. Picosun is based in Espoo, Finland with production, R&D and laboratory facilities in Kirkkonummi, Finland and has its US headquarters in Detroit, Michigan. SUNALE™ ALD process tools are installed in various universities, research institutes and companies across Europe, USA and Asia. Picosun Oy is a part of Stephen Industries Inc Oy.
Source: Picosun (press release)

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