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Posted: February 11, 2010
Olympus Introduces New Dedicated High-resolution Brightfield Objectives for Industrial Imaging
(Nanowerk News) Olympus has introduced the new MPLAPON series of plan apochromatic objectives, which provide the ultimate level of chromatic aberration correction for materials imaging.
Completing the Olympus UIS2 objective range, the MPLAPON objectives are available in 50x and 100x magnification. Developed to provide excellent brightfield imaging, including DIC, the MPLAPON objectives feature numerical apperatures (N.A) of 0.95 and are fully compatible with active auto-focusing units. As a result, highly resolved images can be obtained easily, making the MPLAPON Series ideal for inspecting minute areas in industrial imaging samples, such as semiconductor patterns.
The extremely high resolution capabilities of the MPLAPON objectives enable individual imaging and observation of points separated by only 0.35 µm. Furthermore, with unparalleled correction for chromatic aberrations over an extremely broad wavelength range, these plan objectives provide exceptionally flat and accurately focussed wide field images.
Wavefront abberation control
With a focus on providing equipment of the highest possible quality, Olympus ensures that every objective offers the same outstanding performance. As a result, Olympus has developed the new ‘wavefront aberration control’ process and implemented it into the production of the MPLAPON objective range. With this unique measurement device, small aberrations, not visible to the human eye, can be quantitatively measured and therefore eliminated to produce advanced, high-quality objectives. As a result, these precision objectives enable strehl ratios of at least 95%.
Source: Olympus (press release)
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