The PESM2010 workshop, which will explore recent advances in etching and stripping processes for nanoelectronics technologies, presents a unique opportunity to meet with an international gathering of researchers in the field of plasma etch and strip.
The program includes presentations on plasma-surface interaction, plasma diagnostics, plasma etching for interconnects, post-etch strip and clean and deep plasma etching at the state of the art. Invited papers will be given by scientists in the etching plasma field representing leading companies and research institutes such as IBM, Tokyo Electron Ltd., LAM Research, the Institute of Microelectronics, Penn State University and the laboratory for Microelectronics Technologies (LTM) at the National Center for Scientific Research (CNRS).
CEA is a French research and technology organisation, with activities in three main areas: energy, technologies for information and healthcare, and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC excellence centre, Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, Leti puts a strong emphasis on intellectual property and owns more than 1,400 patent families. In 2008, contractual income covered more than 75 percent of its budget worth 205 M€. For more information, visit www.leti.fr.
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