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Posted: March 8, 2010
Yale University selects Vistec EBPG5000plus Electron-Beam Lithography System for Advanced Nanotechnology Research
(Nanowerk News) Vistec Lithography, Inc. announced today that Yale University, New Haven,
Connecticut, selected Vistec’s EBPG5000plus electron-beam lithography system
for its future nanotechnology research programs. As part of the Yale
Institute for Nanoscience and Quantum Engineering, it will enhance the
effectiveness of research and education at Yale in emerging nanotechnology
and will encourage multidisciplinary research involving Yale faculty, its
students, and associated world-wide research partners.
The Yale EBPG5000plus represents the continued development of the highly
successful EBPG product series. The high performance lithography system is
based on reliable and well-proven system architecture. With further
enhancements in resolution, noise reduction and beam stability, Yale’s
Vistec EBPG5000plus is set to generate structures to less than 8nm on
substrates up to 150mm in diameter, including fragments and special
substrates. Its electron-optical column (TFE source) is rated for
acceleration voltages of 20, 50, and 100kV. The system is equipped for true
100kV / 1mm performance under regular electron-optical conditions with a
wide current capability for high throughput applications. The pattern
generator operates at up to 50MHz. The system incorporates an interactive
graphical user interface (GUI) that provides ease of use for diverse,
multiuser, university type environments.
"The acquisition of the Vistec EBPG5000plus will enable the Yale research
community to explore the expanding field of nanotechnology with a
state-of-the-art electron-beam lithography patterning system. We will
utilize the system for a wide variety of applications including Applied
Physics, Electrical Engineering and Bio-technology. The Vistec system will
allow Yale to remain at the forefront of nanotechnology today and well into
the future", said Dr. Michael Rooks, Facilities Director of the Yale
Institute for Nanoscience and Quantum Engineering. "The EBPG system will
provide the Yale community with not only high quality nanolithography
patterning, but with high flexibility and user friendliness for our various
multidisciplinary activities. Vistec’s system is perfect for our
"Vistec is pleased to be associated with Yale University. We look forward to
our co-operation with Yale’s leading edge nanotechnology researchers and
their programs", noted Rainer Schmid, General Manager Vistec Lithography,
Inc. "Vistec’s association with Yale and its electron-beam research
scientists will hopefully lead to further software and hardware enhancements
for our highly successful EBPG series."
Yale Institute for Nanoscience and Quantum Engineering
The Yale Institute for Nanoscience and Quantum Engineering (YINQE) is a new
initiative at Yale University intended to provide nanofabrication,
microscopy and materials characterization to disparate scientific
disciplines centered on nanoscale research projects. YINQE builds on
existing research strengths in engineering and the physical and life
sciences to broaden interdisciplinary activity among faculty and students
across the entire campus. The Institute provides improved nanomaterials
fabrication capabilities, together with centralized shared characterization.
These facilities complement Yale’s microelectronics clean room,
computational facilities and materials synthesis laboratories.
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and
supplier of electron-beam lithography systems with applications ranging from
nano and bio-technology to photonics and industrial environments like mask
making or direct writing for fast prototype development and design
evaluation. The Vistec Electron Beam Lithography Group combines Vistec
Electron Beam and Vistec Lithography.
Vistec Lithography develops, manufactures, and sells electron-beam
lithography equipment based on Gaussian Beam technology. Their electron-beam
systems are world-wide accepted in advanced research laboratories and
universities. The company is located in Watervliet, NY (USA), within the
Capital Region of New York.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based
on Shaped Beam technology, which is used by leading semiconductor
manufacturers and many research institutes around the world. Their
innovative electron-beam systems are used for microchip production and
integrated optics as well as for scientific and commercial research. The
company is located in Jena (Germany).
Source: Vistec (press release)
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