Nanotechnology training: Learn how to write at the nanometer scale
(Nanowerk News) Electron Beam Lithography (EBL) is a technique used for the patterning of optical masks for semiconductor integrated electronic circuits as well as for writing high-resolution patterns on substrates. It is one of the key nanofabrication technologies for device manufacturing for a wide range of technological and research applications. This training session will provide an introduction to Electron Beam Nanolithography, including the following topics:
Description of the electro-optical, mechanical and electronic components of the E-Beam tool
Discussion of electron-solid interaction concepts such as forward scattering, backward scattering, proximity effects, and correction techniques
Demonstration of sample and data processing including fabrication protocols for E-Beam lithography exposure
Introduction to various E-Beam lithography software packages
ISO 5 (Class 100) cleanroom practice and lab demonstration
This 9-hour training session, which involves 6 hours of classroom time and 3 hours of hands-on experience and lab demonstration, is required preparation for those who wish to use the University of Toronto Electron Beam Nanolithography Facility.
By the end of the training session, participants will have designed and written a nano-device.
Handouts will be provided.
Target Audience: Graduate students, upper year undergrads, and others in academia or industry with a degree in engineering, physics, applied sciences, or life sciences.
Prerequisites: There are no prerequisites, although semiconductor microfabrication experience is helpful.
Schedule: Wednesday, April 21, April 28 and May 5 -- 1 to 3 p.m.
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