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Posted: May 4, 2010

Carl Zeiss to Introduce New Systems for Materials Research and Quality Inspection at Control 2010

(Nanowerk News) At CONTROL 2010 to be held in Stuttgart from May 4-7, 2010, Carl Zeiss will introduce its new and proven system solutions for materials research, quality inspection and routine applications.
The Carl Zeiss Industrial Metrology Group will present high precision measuring systems. The visitors to the exhibition expect tailor-made process solutions, e.g. for suppliers and manufacturers in the auto industry. Further new hardware and software products enable considerable improvements in measuring performance. You can find details about the innovations of this business group at www.zeiss.de/imt.
The Microscopy Group will show solutions for the examination of large samples, such as solar cells, wafers or flat panel displays, using contrasting techniques. New products will also be presented for use in metallography, inspection tasks in production and for polarization microscopy. New LED-based accessories are available for stereomicroscopes. For cross-system microscopy, a platform for correlative microscopy in materials analysis will be presented that creates a link between a light and a scanning electron microscope.
You can find detailed information about the microscope systems and solutions at www.zeiss.de/control-pr.
Source: Carl Zeiss (press release)
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