(Nanowerk News) Nanonex Corporation, the inventor and world’s leading provider in nanoimprint lithography solutions with the longest history, announces the delivery of a Nanonex NX-2500 to Centre National de la Recherche Scientifique (CNRS), France. The NX-2500 imprintor was purchased by BTR program of CNRS to support Basic Technology Research Network in the field of Micro-Nanotechnologies and Nanosciences.
The Nanonex NX-2500 is a full wafer nanoimprinter and photolithography aligner. It is capable of all imprint forms: thermal, photo-curable, and embossing with sub-5nm imprinting resolution and sub-1 micrometer alignment accuracy. Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-2500 offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, which significantly increases mask lifetime.
The NX-2500 will be used as a tool for nanomanufacturing and nano/micro fabrication at the Technology Platform of LAAS in the cutting edge research of nanobiosystem, photonics, ultimate electronics, etc. Nanonex is proud to support the leading edge research at LAAS-CNRS in Toulouse.
About Nanonex Corporation
Nanonex is the inventor of NIL, the world’s first nanoimprint lithography company, and the world’s leading provider of nanoimprint solutions that include equipment, masks, resists and processes. Nanonex’s patented and proprietary NIL solutions and Air-Cushion Press™ can manufacture 3D nanostructures with sub-5 nm resolution, large-area uniformity, accurate overlay alignment, high throughput, and low cost. Nanonex NIL solutions have been adopted by a broad spectrum of applications, such as optical devices, data storage, displays, light emitting diodes, semiconductor ICs, biotech, chemical synthesis, and advanced materials. Nanonex has over 100 customers and an installed base of over 50 tools world-wide.
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