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Posted: June 1, 2010
NanoInk to Make Three Presentations as Part of the Nanotech Conference and Expo
(Nanowerk News) NanoInk, Inc.®, a global leader in nanotechnology, announced today that its NanoFabrication Systems Division will exhibit, sponsor and speak at the 2010 TechConnect World Conference and Expo, presented by the Nano Science and Technology Institute (NSTI) and the Clean Technology and Sustainable Industries Organization (CTSI). The conference will be held from Monday, June 21 through Thursday, June 24 at the Anaheim Convention Center in Anaheim, Calif. TechConnect World is a unique combination of five interconnected conferences focused on technology commercialization: Clean Technology, Nanotech, BioNano, MicroTech and the TechConnect Summit. NanoInk's NanoFabrication Systems Division will make three presentations as part of the Nanotech Conference and Expo.
NanoInk is also the sponsor for the 2010 International Conference on Nanofabrication Technologies, Devices and Applications, which is part of the Nanotech Conference and Expo, and is an interdisciplinary integrative forum on manufacturability in nanofabrication processes and technologies for current and novel devices and applications. Jason Haaheim, senior R&D engineer, NanoInk, is one of three co-chairs for the conference and will give a presentation titled, "Self-Leveling Two Dimensional Probe Arrays for Dip Pen Nanolithography," on Wednesday, June 23 at 11:10 a.m. in room 205 AB.
Also taking part in the conference from NanoInk is Sergey Rozhok, Ph.D., senior research scientist, who will give a presentation titled, "Novel Opportunities for Nanoscale Surface Scanning Probe Lithography," on Tuesday June 22 at 2:10 p.m. in Room 303 A.
Raymond Sanedrin, Ph.D., research scientist, NanoInk, will be presenting a poster during the Nanotech Conference on Wednesday, June 23 at 4 p.m. in the Expo Hall titled, "Multicomponent Nanoarrays: Platform for High Sensitive Protein Detections."
NanoInk will also be exhibiting at booth #422 where its NLP 2000 System desktop nanolithography platform will be available for demonstrations. The NLP 2000 System is an easy to use and affordable desktop nanofabrication system in which patterns of nano to micron-sized features can be created with a wide variety of materials from metal nanoparticles to biomolecules. With the NLP 2000 System, researchers can rapidly design and create custom engineered and functionalized surfaces, using the proven technique of Dip Pen Nanolithography® (DPN®) to transfer minute amounts of materials (easily less than nanoliters) over a large, environmentally controlled work area.
TechConnect World has become the largest venue for emerging technology development and commercialization in the world. The conference is expected to draw over 5,000 attendees from over 70 countries, across major industry segments and along the technology path from research to implementation. The exposition, which features several international pavilions, is expected to host more than 400 companies, universities, equipment manufacturers and solutions providers. These exhibitors will meet with thousands of prospects and potential buyers, who come to the expo to evaluate the latest technology and services. For more information, please visit: www.techconnectworld.com.
Please visit www.nanoink.net or call (847) 679-8807 for more information on the NanoFabrication Systems Division, the NLP 2000 System, and related products and Application Notes.
NanoInk, Inc. is an emerging growth technology company specializing in nanometer-scale manufacturing and applications development for the life science and semiconductor industries. Using Dip Pen Nanolithography® (DPN®), a patented and proprietary nanofabrication technology, scientists are enabled to rapidly and easily create nanoscale structures from a wide variety of materials. This low cost, easy to use and scalable technique brings sophisticated nanofabrication to the laboratory desktop. Located in the new Illinois Science + Technology Park, north of Chicago, NanoInk currently has over 140 patents and applications filed worldwide and has licensing agreements with Northwestern University, Stanford University, University of Strathclyde, University of Liverpool, California Institute of Technology and the University of Illinois at Urbana-Champaign.