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Posted: June 1, 2010
Pennsylvania State University Orders Vistec Electron Beam Lithography System
(Nanowerk News) Vistec Lithography Inc., a world leader in electron beam lithography,
announced a major order with the Pennsylvania State University, University
Park, PA, for one of Vistecís EBPG5200 electron beam lithography systems.
The instrument will become part of the National Science Foundation's
National Nanotechnology Infrastructure Network to support advanced
nanotechnology research across the nation.
The Vistec EBPG5200 will allow fabrication of a diverse set of devices
supporting fundamental and applied research for emerging nanotechnology
applications. With the acquisition of the lithography system and its unique
nanoscale patterning capabilities, the Penn State Nanofabrication Laboratory
will have one of the most advanced electron beam lithography systems for
nanotechnology research and development. Through the National Nanotechnology
Infrastructure Network (NNIN), the EBPG5200 will also be available to other
academic institutes, industries and government entities desiring high
performance electron beam lithography and nanotechnology fabrication
The EBPG5200 system will be installed in the University's new Millennium
Science Complex and will be a cornerstone for current and future Penn State
nanotechnology research. The system is a result of an NSF Major Research
Instrumentation award under the American Recovery and Reinvestment Act of
2009. Additional funding comes from Penn State and the Commonwealth of
The Vistec EBPG5200 is the latest version of the highly successful
EBPG5000plus electron beam lithography system technology. The EBPG52000
system with both 50 and 100 keV accelerating voltages, 50 MHZ pattern
generator and full 20 bit address technology has the demonstrated ability to
routinely pattern to 6-8 nm, address field sizes to 1mm, and accommodate
varying substrates sizes from piece parts of a few millimeters to full
patterning across a 200 millimeter diameter. The EBPG5200 electron optics
and column design provides not only high resolution, but also delivers high
beam currents resulting in very high throughput, high resolution patterning.
Further, the EBPG5200 system that will be installed at Penn State has been
designed with a unique z-axis feature allowing it to accommodate thick or
curved substrates and making it ideal for emerging nanotechnology
applications. Coupled with its extremely flexible Linux based software and
associated GUIís, it is ideal for multiuser, university applications. The
various features of EBPG series have made it a leader for university,
research institute and industry environments where ease of use, high
resolution, throughput and system reliability are required.
"The Vistec team is extremely proud to have been selected by Penn State and
to be associated with the Materials Research Institute and the Penn State
Nanofabrication Laboratory. We are looking forward to our relationship and
to further advance the EBPG5200 system and its capabilities for Penn Stateís
advanced nanotechnology research", said Rainer Schmid, General Manager of
Vistec Lithography Inc., Watervliet, NY, where the system will be
fabricated. "Vistec has been a partner with Penn State over many years. We
welcome the opportunity to have Penn State as a customer and to be
associated with its nanotechnoloy research, its faculty and students."
"We are very excited about our NSF Instrumentation award and the acquisition
of the Vistec EBPG5200", said Theresa S. Mayer, Professor of electrical
engineering and Director of the Penn State Nanofabrication Facility. "The
instrument is the perfect match for our demanding and unique research needs.
It will provide us with a flexible, user friendly, state-of-the-art
patterning capability to explore many new avenues of nanotechnology research
and development using electron beam lithography. We are very pleased to be
partnering with Vistec and look forward to our continued interactions."
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and
supplier of electron-beam lithography systems with applications ranging from
nano and bio-technology to photonics and industrial environments like mask
making or direct writing for fast prototype development and design
evaluation. The Vistec Electron Beam Lithography Group combines Vistec
Electron Beam and Vistec Lithography.
Vistec Lithography develops, manufactures, and sells electron-beam
lithography equipment based on Gaussian Beam technology. Their electron-beam
systems are world-wide accepted in advanced research laboratories and
universities. The company is located in Watervliet, NY (USA), within the
Capital Region of New York.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based
on Shaped Beam technology, which is used by leading semiconductor
manufacturers and many research institutes around the world. Their
innovative electron-beam systems are used for microchip production and
integrated optics as well as for scientific and commercial research. The
company is located in Jena (Germany).