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Posted: August 19, 2010
SPIE Photomask Technology to bring focus to future of the industry
(Nanowerk News) An all-day special session on a roadmap for maskless lithography R&D and a keynote presentation offering insights on how to be successful in the photomask industry will highlight the SPIE Photomask Technology symposium next month in Monterey, California. Nearly 150 technical presentations and a 25-company exhibition are scheduled during the event, which runs 13 through 16 September in the Monterey Marriott Hotel and Monterey Conference Center.
The symposium continues to be the premier worldwide technical meeting for the photomask industry, said Symposium Chair Warren Montgomery(College of NanoScale Science and Engineering and SEMATECH) and Symposium Cochair Wilhelm Maurer (Infineon Technologies). Organizers are anticipating some growth over last year's attendance, a reflection of other signs of revitalization in the industry.
Special session cochairs Brian Grenon (Grenon Consulting) and Wolf Staud (Applied Materials) have solicited contributions from industry luminaries for the Wednesday special session, titled "EBDW/ML2 (e-beam direct-write/maskless lithography): 13.5 nm or 17.3 Picometer? Are We Funding the Right Wavelength/Technology?".
Burn Lin (Taiwan Semiconductor Manufacturing Co.) will give the session keynote talk. Historical background, design challenges, and other topics will be covered by Hans Pfeiffer (HCP Consulting), Neil Berglund (Luxtera), Aki Fujimura (D2S), David Lam (David Lam Group), Tor Sandstrom (Micronic Mydata), and Laurent Pain (Lab. d'electronique de Technologie de l'Information).
Symposium keynote speaker Franklin Kalk, Toppan Photomasks Executive Vice President for Technology, will present on the effect of next-generation lithography on semiconductor business models, in a talk titled "The Future is Bright for Those with Open Eyes."
Special events include an exhibition/poster reception on Tuesday evening, and the symposium reception on Wednesday evening.
The event is sponsored by SPIE and BACUS, with additional sponsorships from SEMATECH, Hitachi High Technologies America, Synopsys, Carl Zeiss SMS, JEOL USA, Mentor Graphics, DNP America, Hoya, Micro Lithography, Applied Materials, Solid State Technology, and Photonics Media.
Conference proceedings papers will be published individually in the SPIE Digital Library as soon as approved after the meeting, and also in collected print and digital volumes and collections.
SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies. Serving more than 180,000 constituents from 168 countries, the Society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth. SPIE annually organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs in North America, Europe, Asia, and the South Pacific, and supports scholarships, grants, and other education programs around the world.
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