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Posted: September 6, 2010
INL Selects Vistec's Electron-Beam Lithography System EBPG5200 for Nanotechnology Research
(Nanowerk News) Vistec Lithography, a leading supplier of advanced electron-beam lithography
systems has announced today that the International Iberian Nanotechnology
Laboratory (INL) in Braga, Portugal has placed an order for Vistec's
electron-beam lithography system EBPG5200. The Portuguese Laboratory is the
first fully international research organization in Europe in the field of
nanoscience and nanotechnology.
The INL, which was established by Portugal and Spain some years ago, has now
moved into the equipping phase of its new research facility, where the
lithography equipment will play an important role. With the Vistec EBPG5200
series and its unique and flexible nanoscale patterning capabilities, the
INL has acquired one of the most advanced electron-beam lithography systems
for nanotechnology research and development. Furthermore, this will be the
first installation of an EBPG5200 system at the Iberian Peninsula.
The Vistec EBPG5200 is the latest version of the highly successive and
field-proven EBPG electron-beam lithography tool series. The EBPG5200 system
can be operated with both 50 and 100kV accelerating voltage and is equipped
with a 50MHz pattern generator and full 20bit address technology. Thanks to
further enhancements in resolution, noise reduction and beam stability, the
Vistec EBPG5200 is set to generate structures to less than 8nm on varying
substrates sizes from piece parts of a few millimetres to full patterning
across a 200mm diameter. However, what makes Vistec's electron beam
lithography of superior standards so unique and actually possible, is the
perfect match of the various system components such as the electron-optical
column, the hardware platform, the data processor and the exposure engine
working together in a flexible and user friendly system. The system
incorporates an interactive graphical user interface (GUI) that provides
ease of use for diverse "multi user environments".
"Nanotechnology has the potential to profoundly impact our future life in
all aspects. The EBPG5200 opens up the opportunity to maintain highest
flexibility and to keep our research activities on track with the
challenging requirements of the future", said Prof. Paulo Freitas, Deputy
Director General at INL.
Commenting on today's announcement, Rainer Schmid, General Manager at Vistec
Lithography, Inc. noted: "At Vistec, we believe that it is essential to
align with leading research organizations in the encouraging field of
nanoscience and nanotechnology. That's why we feel honored by INL's choice
to decide in favor of an EBPG5200."
International Iberian Nanotechnology Laboratory (INL)
INL is an international research organization in the field of nanosciences
and nanotechnology, building a major research effort in the area of
nanomedicine (nanotechnology applied to the medical area), and applications
of nanotechnology to food and environment quality control. These activities
will be supported by transversal research in nanoelectronics and single
molecule based devices. INL is presently equipping its central laboratory
facilities and is recruiting research personnel worldwide.
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and
supplier of electron-beam lithography systems with applications ranging from
nano and bio-technology to photonics and industrial environments like mask
making or direct writing for fast prototype development and design
evaluation. The Vistec Electron Beam Lithography Group combines Vistec
Electron Beam and Vistec Lithography.
Vistec Lithography develops, manufactures, and sells electron-beam
lithography equipment based on Gaussian Beam technology. Their electron-beam
systems are world-wide accepted in advanced research laboratories and
universities. The company is located in Watervliet, NY (USA), within the
Capital Region of New York.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based
on Shaped Beam technology, which is used by leading semiconductor
manufacturers and many research institutes around the world. Their
innovative electron-beam systems are used for microchip production and
integrated optics as well as for scientific and commercial research. The
company is located in Jena (Germany).