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Posted: Oct 19, 2010
Vistec Announces New Technology For Its Electron-beam Lithography Systems
(Nanowerk News) Vistec Electron Beam GmbH announced today that the company is ready to
provide its electron-beam lithography systems with a vacuum compatible
air-bearing based positioning system overcoming the limitations of roller
bearings for future performance requirements. The new platform is designed
to support both Vistec's Variable Shaped Beam (VSB) writers as well as the
Multi Shaped Beam (MSB) lithography system currently under development.
The combination of the new highly sophisticated platform with advanced
variable shaped beam electron optics enables Vistec to address mask writing
as well as electron-beam direct write application demands for future
technology nodes according to the ITRS roadmap. In addition, a multitude of
special application needs, e.g. in the micro- and nanooptics area will be
Vistec's Multi Shaped Beam technology represents one of the most promising
solutions to overcoming the throughput limitations in electron-beam
lithography. By applying MSB techniques the substrate is exposed with an
array of individually controlled shaped beams in parallel instead of a
single shaped beam sequentially. The underlying technology continues to
utilize the basic principle of shaped beams which significantly reduces the
development risk and time. Proof of Lithography has already been
"We will continue to pursue the development of
MSB technology, since we have learned from many occasions that there is a
strong market demand for a commercially available high throughput multi
e-beam writer. The combination with an air- bearing stage platform will
enable Vistec to meet challenging future performance requirements", stated
Wolfgang Dorl, General Manager of Vistec Electron Beam GmbH.
For this aspiring development Vistec has teamed up with uniquely qualified
partners from research organisations and the industry.
Vistec has already received a Purchase Order for an advanced variable shaped
beam lithography tool equipped with an air-bearing stage platform.
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and
supplier of electron-beam lithography systems with applications ranging from
nano and bio-technology to photonics and industrial environments like mask
making or direct writing for fast prototype development and design
evaluation. The Vistec Electron Beam Lithography Group combines Vistec
Electron Beam and Vistec Lithography.
Vistec Lithography develops, manufactures, and sells electron-beam
lithography equipment based on Gaussian Beam technology. Their electron-beam
systems are world-wide accepted in advanced research laboratories and
universities. The company is located in Watervliet, NY (USA), within the
Capital Region of New York.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based
on Shaped Beam technology, which is used by leading semiconductor
manufacturers and many research institutes around the world. Their
innovative electron-beam systems are used for microchip production and
integrated optics as well as for scientific and commercial research. The
company is located in Jena (Germany).