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Posted: Oct 27, 2010

Mattson Technology Millios System at Fraunhofer CNT Selected for Development of Advanced Millisecond Anneal Applications

(Nanowerk News) Mattson Technology, Inc., a leading supplier of advanced process equipment used to manufacture semiconductors, today announced that its Millios™ system, which has been upgraded with the latest temperature measurement and control features at the Fraunhofer Center Nanoelectronic Technologies (CNT), has been selected for joint projects with CNT's leading IC partners for the development of advanced millisecond anneal applications at the 3X nanometer technology nodes and below.
"CNT's objective is to accelerate the introduction of new semiconductor technologies from R&D to production," said Fraunhofer CNT's Professor Dr. Peter Kuecher. "We look forward to continuing to work with Mattson Technology to develop enabling process technologies that will help our semiconductor partners achieve increasingly smaller geometries and fabricate more powerful chips in the next generation of IC manufacturing."
"The Millios installed at this key semiconductor and nanoelectronics research center was selected for the system's demonstrated processing flexibility and unmatched temperature measurement and control to address critical transistor scaling challenges," said Andreas Toennis, senior vice president and general manager of Mattson Technology's Thermal Products Group. "Built on Mattson's production-proven Helios platform, Millios features a patented arc lamp technology that provides enhanced thermal control for advanced applications -- including the formation of gate stacks, nickel silicide, and ultra-shallow junctions -- through the sub-2X nanometer regime. We are excited to collaborate with CNT and its partners to develop leading-edge anneal applications to help our customers fabricate their most advanced device designs at current and future technology nodes."
About Fraunhofer CNT
The Fraunhofer Center Nanoelectronic Technologies (CNT) in Dresden, Germany has been established in 2005 by the Fraunhofer-Gesellschaft in a type of a private public partnership with Infineon Technologies AG and Advanced Micro Devices (AMD). Located within "Silicon Saxony," CNT provides ideal collaboration opportunities for research institutes and material/equipment manufacturers in the field of nanoelectronics. The organization's main focus is the development of advanced process steps for manufacturing in nanoelectronic applications. CNT also works on functional materials and the characterization of devices, the development of new analytic and metrology methods and on the analysis of wafer processing results. For more information, visit: http://www.cnt.fraunhofer.de/en/About_us/
About Mattson Technology, Inc.
Mattson Technology, Inc. designs, manufactures and markets semiconductor wafer processing equipment used in the fabrication of integrated circuits. We are a leading supplier of plasma and rapid thermal processing equipment to the global semiconductor industry, and operate in three primary product sectors: Dry Strip, Rapid Thermal Processing and Etch. Through manufacturing and design innovation, we have produced technologically advanced systems that provide productive and cost-effective solutions for customers fabricating current- and next-generation semiconductor devices. For more information, please contact Mattson Technology, Inc., 47131 Bayside Parkway, Fremont, CA, 94538. Telephone: (800) MATTSON/(510) 657-5900. Internet: www.mattson.com.
Source: Mattson Technology (press release)
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