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Posted: Feb 17, 2011

Nano Patterning Facility for Low/Mid Volume Production

(Nanowerk News) The Institute for Microelectronics Stuttgart (IMS CHIPS), a non-profit foundation of the German state of Baden-Wuerttemberg, recently placed an order for a new electron-beam writer from Vistec Electron Beam GmbH, Jena, Germany. This latest generation writer exposes according to the throughput efficient variable shaped beam principle and is equipped with an air-bearing stage. This allows processing of a large variety of substrates with a minimum structure size down to 30 nm and below while performing at high positioning accuracy.
The funding of this cost-intensive new electron-beam writer was realized by a research partnership between IMS CHIPS and Carl Zeiss SMT GmbH. Financial support is provided by the State of Baden-Wuerttemberg and by Carl Zeiss SMT. This upgrade prepares the worldwide unique infrastructure at IMS CHIPS set for low/mid volume production of complex nano structures on both, wafers and square mask substrates for the next decade.
IMS CHIPS primarily supports SMEs developing micro and nano electronic systems and components. In addition, IMS CHIPS and Carl Zeiss SMT have been working together for many years in highly complex scanner optics used in wafer scanners. These wafer scanners are distributed by the world-market leader ASML in the Netherlands, who holds a strategic partnership with Carl Zeiss SMT GmbH.
The new electron-beam writer at IMS CHIPS will be the basis to continue this successful co-operation with Carl Zeiss SMT and provide the most advanced patterning technology to our SME partners and customers.
Source: Vistec Electron Beam (press release)
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