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Posted: Feb 24, 2011
CEA-Leti and ASELTA Create Joint Lab to Address Manufacturing Challenges of Mask and Direct-Write Lithography
(Nanowerk News) CEA-Leti and ASELTA Nanographics, its newly incorporated startup, today announced they will jointly develop e-beam proximity effects correction solutions for both mask writing and maskless lithography (ML2) applications. This common lab is staffed with a joint team of CEA-Leti and ASELTA personnel. Part of this collaboration will be done inside the multi-partner IMAGINE program, which is designed to develop maskless lithography for IC manufacturing.
Launched in November 2009, ASELTA Nanographics develops software that reduces production costs for chips at the 32nm node and beyond by improving fab-process precision, including cycle time and lithography-image quality.
"ASELTA is excited about funding a joint laboratory with CEA-Leti in order to get access to leading edge e-beam equipment and validate its work on e-beam proximity effects correction," said Serdar Manakli, ASELTA CEO. "E-beam proximity effects have been under-estimated so far. Our experience has proven that with our unique expertise, we can provide our customers with dramatic productivity improvement and lifetime extension of current equipment. The fact that more and more partners are joining partnership programs like IMAGINE is a validation of our vision."
"Launching and supporting startups in one of our main missions and ASELTA is one of the most promising companies to come out of Leti. It is addressing key maskmaking challenges for both critical dimension (CD) control and writing speed," said Serge Tedesco, CEA-Leti program manager. "Moreover, the growing interest in ML2 has to be supported from the point of view of proximity-effect correction and CEA-Leti, with its industrial IMAGINE program, will provide the right environment."
ASELTA is a privately funded French company providing software environment mostly for the e-beam market. A CEA-LETI spin-off, incorporated in November 2009, ASELTA has production customers benefiting from its technology. Its unique architecture allows customers to increase resolution, accuracy and reduce writing time for their e-beam equipment with a seamless plug-and-play environment. Its corporate headquarters are at Minatec BHT, Bat.52 7 Parvis Louis Néel, BP50, 38040 Grenoble. Email: firstname.lastname@example.org
CEA is a French research and technology organization, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families. For more information, visit www.leti.fr.