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Posted: Jun 13, 2011

Picosun Doubles Profitability

(Nanowerk News) Picosun Oy, globally operating manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems, has achieved its fifth consecutive profitable fiscal year from May 2010 to April 2011. Picosun's turnover increased by 100 %, as reported by Picosun CEO Kustaa Poutiainen in the company's Annual Shareholder's Meeting last week.
In the same meeting, also the company's Board of Directors was chosen. Mr. Kustaa Poutiainen, CEO of Picosun and Stephen Industries Inc. Oy, continues as the Chairman of the Board. The other Board Members are: Mr. Sven Lindfors, Picosun CTO and the world's most experienced ALD tool designer; Mr. Timo Malinen, production and sales expert; D. Sc. (tech.) and Professor Lauri Niinistö, developer of ALD processes and applications since the late 1970's; Professor Jorma Routti, Manager of Knowledge Economy project at the World Bank and former Director-General for Research at the European Commission from 1995 to 2000; and D. Sc. (tech.) Tuomo Suntola, inventor of the ALD method in 1974 and the winner of the European SEMI award in 2004.
The goal for the next year is also set high: to continue the striking 100 % growth. Mr. Poutiainen is confident: "We have moved forward as a company in every aspect. Our trademark, dedication to continuous product development, has led to unparalleled equipment quality. This is again reflected in the impressive results our customers have achieved with our SUNALE™ tools. The new industrial breakthrough predicted for ALD is already happening." Mr. Poutiainen continues: "There is a growing ALD market for our top quality, fully automated products for both R&D and high volume industrial production. Our unique equipment design enables cost-effective production of devices by ALD in completely new applications, some of which represent the world's fastest growing fields of industry. This guarantees us a rapidly increasing share of customer's investments on new ALD equipment".
Picosun's recent product launches fulfil the most stringent industrial standards, and have been one of the major factors facilitating the company's impressive growth. Picosun's SUNALE™ P-series batch reactor can be easily upscaled to fully automatized cluster unit capable of coating even several thousands of wafers per hour. Another new product that has been warmly welcomed by several key customers already on three continents is the Picoplasma™ source system (multiple patents pending), a remote, "ion-free" plasma generation unit which can be installed on already existing SUNALE™ systems or purchased with the basic ALD reactor as a fully integrated PEALD (plasma-enhanced ALD) turnkey package. The most recent product launch, the Picoplatform Cloverleaf™ system, is an innovative and multifunctional ALD cluster unit capable of deposition of dozens of different materials without any vacuum breaks between the process steps.
Picosun Oy is based in Espoo, its manufacturing facilities are located in Kirkkonummi and U.S. headquarters in Detroit, Michigan. Picosun Oy is a part of Stephen Industries Inc Oy.
Source: Picosun (press release)
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