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Posted: Aug 25, 2011

Maskless lithography IMAGINE workshop set for Sept. 6 in Tokyo

(Nanowerk News) CEA-Leti announced today that the 2nd Maskless Lithography IMAGINE Workshop will be held Sept. 6 at the Keio Plaza Hotel in Tokyo.
CEA-Leti and MAPPER Lithography B.V. launched the IMAGINE program in July 2009 with the delivery of MAPPER's Massively Parallel Electron Beam Platform to Leti.
The platform is the core technology on which the IMAGINE program is built. This program provides the world's major chip manufacturers with the opportunity to assess the maskless lithography technology in a real manufacturing environment. In addition, the program will develop and qualify the complete infrastructure from data preparation to process integration, in preparation for its industrial introduction.
Workshop participants will:
  • Get a technical update on the program's main achievements
  • Learn about MAPPER's technology roadmap
  • Hear about and discuss the lithography options for the 22nm node and beyond
  • MAPPER, based in Delft, The Netherlands, makes maskless-lithography machines for the semiconductor industry. It is supporting the IMAGINE project with its massively parallel electron-beam platforms.
    To register for the workshop, contact Thomas Iljic: (+81) 03 57 98 63 39, or
    About CEA-Leti
    Leti is an institute of CEA, a French research-and-technology organization with activities in energy, IT, healthcare, defence and security. Leti is focused on creating value and innovation through technology transfer to its industrial partners. It specializes in nanotechnologies and their applications, from wireless devices and systems, to biology, healthcare and photonics. NEMS and MEMS are at the core of its activities. An anchor of the MINATEC campus, CEA-Leti operates 8,000-mē of state-of-the-art clean room space on 200mm and 300mm wafer platforms. It employs 1,400 scientists and engineers and hosts more than 190 Ph.D. students and 200 assignees from partner companies. CEA-Leti owns more than 1,700 patent families. For more information, visit
    Source: CEA-Leti
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