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Posted: Sep 07, 2011
Vistec Expands its Activities in the Chinese Market
(Nanowerk News) Vistec Electron Beam
Lithography Group, a leading supplier of Electron Beam
Lithography systems, continues to expand its activities in China. The Group
held an Electron-Beam Lithography Workshop in partnership with the NCNST
(National Centre of Nanoscience and Technology) in Beijing on September 6th,
2011 and will participate in the ChinaNANO 2011. The
International Conference on Nanoscience and Technology takes place in
Beijing from September 7th till 9th, 2011.
"Looking at the developments in China over the past decade it is magnificent
what has been achieved. We still see an enormous demand for electron-beam
lithography to satisfy the challenging nanolithography applications.
Therefore our aim is to enforce our current activities", explains Ines
Stolberg, Marketing Manager at Vistec Group. "Being at the ChinaNANO
conference is one step of Vistec's long term marketing & sales strategy.
Further steps are organizing regular workshops, being present at trade shows
and having an individual customer support."
As part of this, Vistec has organized a workshop, in partnership with one of
its Beijing based customers NCNST, who has enthusiastically agreed to act as
host, before this year's ChinaNANO 2011 conference, on September 6th, 2011.
"This was an important step towards informing the Chinese market of what
electron-beam lithography has to offer for leading edge technology centres
such as NCNST", reflects Stolberg.
At the workshop Vistec has been pleased to welcome experts in their field
like Prof. Chen Baoqin, IMECAS, Dr. Peter Hahmann and Dr. Ralf Steingrueber,
Fraunhofer HHI, who gave technology presentations in both electron-beam
technology in general and the use of such systems for the development of new
devices for various applications.
More than 40 scientists from leading edge research institutes and
universities / Centers of excellence from throughout China attended the
At the ChinaNANO 2011 Vistec focuses on its EBPG5200 Series and EBPG5000
Series systems. These systems have evolved over many years with considerable
input and feedback from Vistec's extensive worldwide customer base and
fulfil the needs of tomorrows required accuracy and resolution along with
flexibility for a wide range of applications. Vistec is also a manufacturer
of high throughput Variable Shaped Beam systems for industrial mask and
direct write manufacturing.
"Overall we see our self very well placed to meet the needs of the fast
moving Chinese market for both Research & Development as well as industrial
applications", explains Stolberg. "We are pleased to discuss this in more
detail at the ChinaNANO 2011 by our team of experts present."
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group (www.vistec-semi.com) is a global manufacturer and
supplier of electron-beam lithography systems with applications ranging from
nano and bio-technology to photonics and industrial environments like mask
making or direct writing for fast prototype development and design
evaluation. The Vistec Electron Beam Lithography Group combines Vistec
Lithography and Vistec Electron Beam.
Vistec Lithography develops, manufactures, and sells electron-beam
lithography equipment based on Gaussian Beam technology. Their electron-beam
systems are world-wide accepted in advanced research laboratories and
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based
on Shaped Beam technology, which is used by leading semiconductor
manufacturers and many research institutes around the world. Their
innovative electron-beam systems are used for microchip production and
integrated optics as well as for scientific and commercial research.