The latest news from academia, regulators
research labs and other things of interest
Posted: Sep 20, 2011
Mentor Graphics and NuFlare Technology Extend Collaboration to Address Advanced Maskwriting Challenges
(Nanowerk News) Mentor Graphics Corporation and NuFlare Technology, Inc. today announced the extension of their successful collaboration on integrated hardware and software solutions for advanced IC mask generation. The companies' new joint marketing and support agreement will help ensure seamless interfaces, high mask fidelity, fast mask writing times, and very high levels of technical support.
The new agreement covers the Mentor Graphics® Calibre® FRACTUREt™, Calibre FRACTUREv™, Calibre MDPmerge™, Calibre MDPverify™, Calibre nmMPC and Calibre MDPview™ products. These are used with NuFlare mask writers starting with the EBM-3000, all the way up to the EBM-8000 series, and are being expanded for future generation machines to perform data preparation, process correction and verification of mask data to improve the fidelity of the final mask pattern. NuFlare will also use Mentor tools to explore innovations during research and development, to verify new product features, and to assist in customer support. Past efforts between Mentor and NuFlare have resulted in the definition of an OASIS.MASK input interface and the definition of format extensions to carry dose annotation for advanced mask writing on future generation tools.
"Mentor is the recognized industry leader in OPC, MDP and MPC, and has proven to be a reliable and innovative strategic partner during our longstanding collaboration to date," said Kiyoshi Hattori, director and general manager of NuFlare's Mask Lithography Engineering department. "Our engagement has delivered many benefits for our mutual customers in OASIS.MASK support, mask process correction advances, and mask write time reduction techniques."
"We're very pleased to extend our relationship with NuFlare, an acknowledged leader in mask writing equipment. Our close cooperation has provided many technology and service benefits to our mutual customers," said Joseph Sawicki, vice president and general manager of the Mentor Design to Silicon division. "We look forward to tackling the significant challenges of advanced IC manufacturing together as we push beyond the historical limits of IC scaling."
About Mentor Graphics
Mentor Graphics Corporation is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $915 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.
About NuFlare Technology, Inc.
NuFlare Technology, Inc. is a supplier of mask writing systems, mask inspection systems, and epitaxial reactor systems. NuFlare has the world's top market share in e-beam mask writing systems and is a technology leader in mask writing systems with its production, R&D and support sites in Japan, USA, Germany, Korea and Taiwan. In fiscal year 2010/2011, NuFlare Technology, Inc. generated consolidated revenues of over JPY 30 billion. Headquarters are located at Shin-Yokohama Business Center Bldg. 10F, 3-2-6, Shin-Yokohama, Kohoku-ku, Yokohama, Kanagawa, Japan 222-0033. World Wide Web site: http://www.nuflare.co.jp.