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Posted: Dec 07, 2011
IMS Nanofabrication Announces Equity Funding Round with Intel Capital and Photronics
(Nanowerk News) IMS Nanofabrication AG (www.ims.co.at), an innovator in nanometer scale mask and direct write lithography imaging technology for semiconductor manufacturing applications, today announced that it has signed an equity funding round with participation from Intel Capital, Photronics Inc. and private investor groups.
"We are pleased to announce the funding support being provided by Intel Capital, Photronics and our existing investor groups as we work to commercialize our electron multi-beam mask exposure tool (eMET) for sub 22nm mask writing applications," said Max Bayerl, CEO of IMS. "The additional resources will help IMS to demonstrate a 256 thousand e-beam mask writer column with initial exposures by the end of 2011." Technical feasibility for the eMET platform concept was established via work completed under a proof of writing strategy (POWS) program completed earlier in 2011.
"Intel Capital is pleased to support the innovation in electron multi-beam patterning being driven by IMS," said Keith Larson, vice president, Intel Capital. "Successful demonstration of an electron multi-beam mask writer column would be a significant step forward in addressing industry needs for higher productivity mask writing capability at finer levels of resolution."
Photronics is joining the equity round to support the development of technology that allows it to provide leading edge mask production capability to its customers. Christopher Progler, Chief Technology Officer, Photronics, said, "Our investment in IMS demonstrates our commitment to invest in technologies that can keep Photronics on the cutting edge of mask writing technology."
The equity funding will be used to complete an electron multi-beam mask exposure tool proof-of-concept (eMET POC ) to support tool characterization, column optimization and infrastructure enhancements that set the stage for commercialization. Additional terms of the transaction are not being disclosed. The equity funding agreement is subject to satisfaction of customary closing conditions with closing expected to occur by the end of 2011.
IMS Nanofabrication AG is an Austrian based high-tech company that was founded in December 2006 through the merger of the former IMS Nanofabrication GmbH and IMS - Ionen Mikrofabrikations Systeme GmbH. Based on its extensive know-how in charged particle systems, IMS offers solutions to directly transfer custom designed patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers. IMS focuses its efforts on the development and production of key tool components for mask writing and direct write lithography applications. It plans to commercialize its technology and related services in cooperation with the strategic investors participating in this funding round and with other parties involved in the mask and lithography ecosystem. For more information on IMS Nanofabrication AG, visit www.ims.co.at.