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Posted: Jan 16, 2012

Wuhan National Laboratory for Optoelectronics Signed Off Its E-beam Lithography System From Vistec

(Nanowerk News) Vistec Lithography, B.V. is pleased to announce today that Wuhan National Laboratory for Optoelectronics (WNLO) at the Huazhong University of Science and Technology (HUST) in Wuhan, P.R. of China signed off its electron-beam lithography system Vistec EBPG5000pES. The WNLO, a national lab in the field of optoelectronics, HUST, a national key university in China, and Vistec Lithography, a leading supplier of electron-beam lithography systems, consider that event as a major milestone in their strategic partnership.
The Vistec EBPG5000pES electron-beam lithography system will enable WNLO to further strengthen its leading position in photonics and optoelectronics research and development. "The EBPG5000pES facilitates us to achieve all the lithography challenges we are facing in our research. In respect to application support and service we know that we can count on the Vistec team as our strategic partner", stated Prof. Jinsong Xia, director of the Optoelectronic Micro & Nano Fabrication and Characterization Facility (OMFC) at WNLO.
The Vistec EBPG5000pES is a high-end lithography tool based on reliable and well-proven system architecture. With its flexible electron-optical column and high brightness TFE source, allowing 50 and 100kV operation, the system provides a spot size down to < 2.2nm, thus enabling nano-lithography structures smaller than 8nm to be routinely generated. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments.
"We are very pleased to have reached this significant milestone in our partnership with WNLO at HUST, who can be assured that Vistec will be supporting them to the very best", said Erwin Mueller, Managing Director Vistec Lithography, B.V. "The electron beam lithography system at WNLO is the first operational Vistec EBPG5000pES in the P.R. China, which opens great opportunities to a sustainable business development for Vistec in that region."
Wuhan National Laboratory for Optoelectronics
Wuhan National Laboratory for Optoelectronics (WNLO), co-established by the Ministry of Education, Hubei Provincial Government and Wuhan Municipal Government, is one of the first five national laboratories authorized in November 2003 by the Ministry of Science and Technology of the PRC, which also approved the feasibility plan for its construction in November 2006. The Laboratory is managed by Huazhong University of Science and Technology (HUST) and in collaboration with Wuhan Research Institute of Posts and Telecommunications (WRI), Wuhan Institute of Physics and Mathematics (WIPM) affiliated to the Chinese Academy of Sciences (CAS) and Huazhong Institute of Optoelectronic Technology (HIOT). More detailed information of WNLO can be found on the website
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Source: Vistec (press release)
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