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Posted: Apr 26, 2012
Vistec Provides ITME in Warsaw With a High-performance Electron-beam Lithography System
(Nanowerk News) Vistec Electron Beam
GmbH, a leading supplier of electron-beam lithography systems, announced
that the noted Institute of Electronic Materials Technology (ITME) in Warsaw
purchased a Variable Shaped Beam system SB251 from Vistec. The advanced
lithography tool will be used for research and manufacturing of various
kinds of micro-optical and diffractive elements, new materials as well as
masks for optical lithography.
As a leading research institute in Poland, ITME is working in the
multidisciplinary area of research, development and manufacturing of
materials, innovative devices and components for application in electronics,
micromechanics and optoelectronics. "We selected Vistec's electron-beam
writer to support our research, development and manufacturing efforts due to
its high performance and flexibility. We anticipate that the new Vistec
SB251 will significantly contribute to successfully meet our research and
development agenda", said Dr. Zygmunt Luczynski, director of ITME. The
decision was made as a result of a European tendering procedure.
The Vistec SB251 is a universal system, which has been designed for both
direct write as well as mask making exposures. The system is capable of
handling and exposing transparent & non-transparent materials, which are in
use in semiconductor and optics applications. Equipped with a 50kV electron
optics, an address grid of 1nm and an exposure platform with a stage travel
range of 210mm x 210mm the system enables lithography below 50nm on various
substrates from pieces up to 200mm wafers and 7inch masks. A Graphical User
Interface (GUI) and fully automated cassette-to-cassette substrate handling
allow the effective usage in a diverse, multiuser environment at Institutes
like ITME. Furthermore the system features the data preparation software
package ePLACE (provided by EQUIcon GmbH).
"With the Vistec SB251 our long term partner ITME receives an advanced
electron-beam lithography system. Due to its high flexibility and
reliability the SB251 is perfectly tailored to the diversified applications
ITME is facing now and will be challenged with in the future", comments
Wolfgang Dorl, General manager of Vistec Electron Beam. "We are very pleased
that ITME placed the order with Vistec, which further continues our
successful collaboration started more than 20 years ago."
ITME is a leading Polish Institute of multi-research to develop new
materials and materials based on these innovative tools and components for
applications in electronics, microsystems, optoelectronics, micromechanics,
metrology, etc. High-tech materials, instruments and components developed at
the Institute enable scientific collaboration with universities and research
institutes, are published in Polish and international journals, offered to
interested customers to implement their projects, implemented in the
industry or used for short series production within the Institute.
The ITME manufacturing technologies are being developed for single crystals
of semiconductor materials, oxide crystals (optical, piezoelectric),
super-pure metals, glass active. Nanotechnologies are widely used in studies
of new materials such as photonic crystals, meta materials make it possible
to produce super-pure materials, glass active fiber, photonic, a new (active
and transparent) nano-ceramic and composite materials, which have unique
properties in a wide range of applications.
The Institute developed epitaxial structures for electronic and
optoelectronic devices, innovative lasers, photo detectors, sensors,
filters, piezoelectric, diffractive lenses. The idea of single-crystal
growth method invented by Prof. Jan Czochralski, (widely used in the world)
is continued at the Institute. Development of this method, leads to the
subsequent development of highly advanced technologies in a field of
semiconductor and oxide single crystals.
For more information see: http://www.itme.edu.pl/home-page.html
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and
supplier of electron-beam lithography systems with applications ranging from
nano and bio-technology to photonics and industrial environments like mask
making or direct writing for fast prototype development and design
evaluation. The Vistec Electron Beam Lithography Group combines Vistec
Lithography and Vistec Electron Beam.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based
on Shaped Beam technology, which is used by leading semiconductor
manufacturers and many research institutes around the world. Their
innovative electron-beam systems are used for microchip production and
integrated optics as well as for scientific and commercial research.
Vistec Lithography develops, manufactures, and sells electron-beam
lithography equipment based on Gaussian Beam technology. Their electron-beam
systems are accepted world-wide in advanced research laboratories and
Source: Vistec (press release)
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