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Posted: May 31, 2012

JEOL Introduces Ultra-high Resolution Analytical Field Emission SEM

(Nanowerk News) JEOL's new series of field emission scanning electron microscopes is now complete with the introduction of the sub-nanometer imaging resolution JSM-7800F. The JSM-7800F represents a significant leap forward in Field Emission SEM technology, with unmatched resolution and stability for nanotechnology imaging and analysis.
JEOL's highest performance FE-SEM makes it possible to:
  • observe the finest structural morphology of nanomaterials at 1,000,000X magnification with sub-1nm resolution
  • perform low kV imaging and analysis of highly magnetic samples.
  • collect large area EBSD maps at low magnifications without distortion
  • image thin, electron transparent samples with sub 0.8 nm resolution using an optional retractable STEM detector
  • JEOL JSM-7800F Ultra-High Resolution Analytical FE SEM
    JEOL JSM-7800F Ultra-High Resolution Analytical FE SEM
    "JEOL now offers a full line of analytical, high performance electron microscopes to fit every technical performance requirement and budget," said Vern Robertson, SEM Technical Sales Manager at JEOL USA.
    Optimized for extreme imaging and analysis
    The JSM-7800F uniquely combines an in-lens field emission gun with an aperture angle control lens (ACL), optimizing large probe currents (up to 200 nA) for operation at the smallest probe diameter. The new super hybrid lens design and versatile in-column detectors with filtering capabilities allow observation of any specimen, especially at ultra-low accelerating voltages down to 10V. The SEM excels at low accelerating voltage X-ray spectroscopy and cathodoluminescence, combining large beam currents with a small interaction volume and dramatically increasing analytical resolution to the sub 100nm scale. Beam deceleration in GB Mode decreases charging on nonconductive samples and reduces lens aberration effects for extreme high resolution imaging.
    Ultimate versatility
    The JSM-7800F is suitable for a wide variety of applications, from cryo-microscopy to electron beam lithography, and can be configured for low vacuum operation. It accommodates multiple analytical attachments, including EDS, WDS, STEM, BSE, CL, EBIC, and an IR camera and stage navigation camera. The SEM comes with a choice of three stage sizes and three specimen exchange airlock sizes. It can also be equipped with tensile, heating, and cooling stages for in situ experiments.
    JEOL USA, Inc.
    JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.
    JEOL USA, Inc., a wholly owned subsidiary of JEOL, Ltd., Japan, was incorporated in the United States in 1962. The company has 13 regional service centers that offer unlimited emergency service and support in the U.S. For more information about JEOL USA, Inc. or any JEOL products, visit www.jeolusa.com, or call 978-535-5900.
    Source: JEOL (press release)
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