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Posted: November 14, 2007
Picosun and Danish Technological Institute Announce Co-operation in Atomic Layer Deposition
(Nanowerk News) Picosun Oy, Finland has entered into a co-operation agreement with Danish Technological Institute. Centre for Microtechnology and Surface Analysis at Danish Technological Institute (DTI) has established a new Atomic Layer Deposition (ALD) facility. This facility opens the possibility to make conformal coatings on 3D structures, porous samples, and even into high aspect ratio trenches. The ALD technique provides inherently unique thickness control and coating quality by its self-limiting layer-by-layer growth.
"The ALD tool expands our range of nanocoating tools that also counts Molecular Vapor Deposition and Plasma Enhanced Chemical Vapour Deposition. Each of the coatings techniques has unique features. With this palette of coatings we can offer to design surface properties on request" says Leif Højslet Christensen, Head of Centre.
Along with the facility build-up Picosun Oy, the Finnish manufacturer of the ALD tool and DTI have entered into a collaboration agreement. A central part in the collaboration agreement is to establish an automated ALD coating facility that enables manufacturing of coatings in production series volumes.
"We are pleased that the Danish Technological Institute has chosen Picosun Oy as partner in Atomic Layer Deposition business. Centre for Microtechnology and Surface Analysis provides services to a wide range of customers in the Danish Industry. Our collaboration on creating an ALD production facility will be a welcome window of display to show Danish and Nordic companies the benefits of the ALD technique", states Juhana Kostamo, Managing Director of Picosun Oy.