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Posted: December 13, 2007
New JEOL MultiBeam SEM/FIB for Simultaneous Micro Milling and High Resolution SEM Imaging
(Nanowerk News) JEOL USA introduces a new high throughput SEM/FIB that combines Focused Ion Beam micro milling with the high resolution imaging of the JEOL LaB6 electron column. The MultiBeam is a high-productivity tool for IC defect analysis, circuit modification, TEM thin film sample preparation, and mask repair.
A versatile all-in-one system, the MultiBeam features serial slicing and sampling (S3TM) for in-process monitoring of milling, fabrication, and reconstructing 3D images of the sectioned area. A maximum milling current of 30 nA ensures high throughput milling of large areas.
Additional features include low vacuum operation for non-conductive specimens without coating or alteration, a gas injection system for etching and deposition, a large stage for up to 150 mm samples, and a multiple port design for a range of analytical needs. Samples are loaded through a standard airlock system.
Two new nano-imaging labs will take delivery of the MultiBeam systems in early 2008. JEOL USA has formed a partnership with both the University of Southern California and Boston College which will advance applications research on the east and west coasts.
About JEOL USA, Inc.
JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.
JEOL USA, Inc., is a wholly owned subsidiary of JEOL, Ltd., Japan, was incorporated in the United States in 1962. The company has 13 regional service centers that offer unlimited emergency service and support in the U.S.
For more information about JEOL USA, Inc. or any JEOL products, visit www.jeolusa.com, or call 978-535-5900.