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Posted: March 3, 2008
SUSS MicroTec Boosts Nanotechnology with New Toolset for Mask Aligners
(Nanowerk News) SUSS MicroTec, supplier of innovative solutions for the 3D, MEMS, Advanced Packaging and Nanotechnology markets, has launched an advanced nanotechnology toolset for its Mask Aligners. The new Nano Imprint Lithography (NIL) tool enables SUSS Aligners to print resist thicknesses from less than 100 nanometers to a few hundred microns with a printing resolution down to a few nanometers.
UV-NIL is a low-cost production technology that is based on UV-curing. It has been developed as a cost-effective alternative to high-resolution e-beam lithography to print sub-20 nanometer geometries. UV-NIL applications with promising perspectives include semiconductor, MOEMS, NEMS and optoelectronic technologies.
This toolset can be upgraded on any previously installed SUSS MA6 Mask Aligner with very limited effort. Therefore SUSS MicroTec offers its customers an easy and quick step into the world of Nano.
“Nanotechnology represents a promising new business opportunity for SUSS MicroTec”, said Rolf Wolf, General Manager of SUSS MicroTec Lithography division. “With the new UV-NIL tooling for mask aligners, SUSS MicroTec is once again providing market leadership for evolutionary as well as revolutionary innovative processing techniques.“